Other

Gtat Corporation

Oci Company Ltd.

Advanced Material Solutions, LLC

Jeffrey C Gum

Carl Chartier

Wenjun Qin

Aaron Dean Rhodes

Chad Fero

Shawn D Skinner

Wenjun L Chinn

Shiva Mandepudi

F Scott Fahrenbruck

Paul E Gannon

Laura E Moran

Bryce E Clark

Mike McFarland

Andy Schweyen

Keith Ballenger

A reaction chamber includes an enclosure having an interior coated with a metal nitride compound providing an average reflectivity to internal infra-red radiation of greater than 90%. The metal nitride compound can be titanium nitride, zirconium nitride, hafnium nitride, or a nitride of another metal, and can be between 0.1 and 10 microns thick, preferably between 4 and 5 microns thick. The layer does not tarnish, and can withstand reaction chamber temperatures up to at least 250&#xb0; C., preferably up to 300&#xb0; C. It is applied by a deposition process, such as PVD, CVD, thermal spray, or cathodic arc, wherein the enclosure itself is the metal nitride deposition enclosure. Uniformity of deposition can be improved by rotating the deposition source through T degrees and back through T&#xb1;d, with a total of 360/d repetitions. The reactor can be a CVD reactor that deposits polysilicon onto a heated filament.

Radiation shielding for a CVD reactor

A method is provided for stabilizing filaments in a chemical vapor deposition (CVD) reactor. The method includes providing the pair of filaments, and connecting the pair of filaments with at least one stabilizer. The stabilizer may include an electronically insulating material.

Method for stabilizing filaments in a chemical vapor deposition reactor

In various embodiments, systems, methods, and apparatus are provided for stabilizing filaments in a chemical vapor deposition (CVD) reactor system. A system includes a base plate having a plurality of electrical connections, a pair of filaments extending from the base plate, and a stabilizer connecting the pair of filaments. Each filament is in electrical contact with, and defines a conductive path between, the two electrical connections. A method of stabilizing the filaments includes providing the pair of filaments, and connecting the pair of filaments with at least one stabilizer. The stabilizer may include an electrically insulating material.

Methods and systems for stabilizing filaments in a chemical vapor deposition reactor

A reverse fluidized bed reactor (FBR) is separated by a thermally insulating vertical divider into a pre-reaction heating zone, a reaction zone, and a dehydrogenation zone. The dehydrogenation zone can be distinct, or the heating zone can serve as the dehydrogenation zone. Particles of polysilicon circulate upward through the heating zone and into the top of the reaction zone, where deposition of silicon occurs, and the grown particles slowly settle until they reenter the bottom of the pre-reaction heating zone. Dust formation, wall deposition, and hydrogen content in the product silicon particles are thereby minimized.

Reverse circulation fluidized bed reactor for granular polysilicon production

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Stevensville, MT, United States of America

Jeffrey C Gum