Soitec

Universitè Catholique De Louvain

S.o.i.tec Silicon on Insulator Technologies

Jean-Pierre Raskin

Oleg Kononchuk

Ionut Radu

Martin Rack

Marcel Broekaart

Frédéric Allibert

Eric Desbonnets

François Brunier

Cédric Malaquin

Eric Desbonnet

Dimitri Lederer

Gilles Scheen

Jonathan Rasson

Thomas Pardoen

Michaël Coulombier

Nicolas André

Damien FABRÈGUE

Substrates for microelectronic radiofrequency devices may include a substrate comprising a semiconductor material. Trenches may be located in an upper surface of the substrate, at least some of the trenches including a filler material located within the respective trench. A resistivity of the filler material may be 10 kOhms·cm or greater. A piezoelectric material may be located on or above the upper surface of the substrate. Methods of making substrates for microelectronic radiofrequency devices may involve forming trenches in an upper surface of a substrate including a semiconductor material. A filler material may be placed in at least some of the trenches, and a piezoelectric material may be placed on or above the upper surface of the substrate.

Structures for radiofrequency applications and related methods

A substrate has a front side including an electrical circuit and a rear side including an exposed zone that faces the electrical circuit. In an electrochemical treatment step, an electrical potential is laterally applied at least to the exposed zone of the rear side of the substrate, while the exposed zone is in contact with a chemically reactive substance. The electrical potential causes a lateral flow of electrical current at least in the exposed zone of the substrate. The lateral flow of current and the chemically reactive substance alter the substrate in at least the exposed zone.

Method of electrochemically processing a substrate and integrated circuit device

Substrates for microelectronic radiofrequency devices may include a substrate comprising a semiconductor material. Trenches may be located in an upper surface of the substrate, at least some of the trenches including a filler material located within the respective trench. A resistivity of the filler material may be 10 kOhms&#xb7;cm or greater. A piezoelectric material may be located on or above the upper surface of the substrate. Methods of making substrates for microelectronic radiofrequency devices may involve forming trenches in an upper surface of a substrate including a semiconductor material. A filler material may be placed in at least some of the trenches, and a piezoelectric material may be placed on or above the upper surface of the substrate.

An integrated circuit device includes a semiconductor substrate having a resistivity of at least 100 &#x3a9;&#xb7;cm. An electrically insulating layer contacts the semiconductor substrate. The electrically insulating layer is susceptible of inducing in the semiconductor substrate a parasitic surface conduction layer that interfaces with the electrically insulating layer. An electrical circuit is located on the electrically insulating layer. The electrical circuit includes a section capable of inducing an electrical field in the semiconductor substrate. The integrated circuit device includes a depletion-inducing junction of which at least a portion is comprised in the semiconductor substrate. The depletion-inducing junction can autonomously induce in the semiconductor substrate a depleted zone that interfaces with a section of the electrically insulating layer that lies in-between two sections of the electrical circuit.

Integrated circuit device and method of manufacturing thereof

A substrate for microelectronic radiofrequency devices includes a carrier substrate made of a first semiconductor material having a resistivity higher than 500 ohms-cm; a plurality of trenches in the carrier substrate, which trenches are filled with a second material, and defining on a first side of the carrier substrate a plurality of first zones made of a first material and at least one second zone made of a second material. The second material has a resistivity higher than 10 kohms-cm, and the first zones have a maximum dimension smaller than 10 microns and are insulated from one another by the second zone.

Structure for radiofrequency applications

A method for minimizing harmonic distortion and/or intermodulation distortion of a radiofrequency signal propagating in a radiofrequency circuit formed on a semiconductor substrate coated with an electrically insulating layer, wherein a curve representing the distortion as a function of a power of the input or output signal exhibits a trough around a given power (P), the method comprises applying, between the radiofrequency circuit and the semiconductor substrate, an electrical potential difference (V) chosen so as to move the trough toward a given operating power of the radiofrequency circuit.

Method for minimizing distortion of a signal in a radiofrequency circuit

The disclosure relates to a device for measuring an electrical characteristic of a substrate comprising a support made of a dielectric material having a bearing surface, the support comprising an electrical test structure having a contact surface flush with the bearing surface of the support, the bearing surface of the support and the contact surface of the electrical test structure being suitable for coming into close contact with a substrate. The measurement device also comprises at least one connection bump contact formed on another surface of the support and electrically linked to the electrical test structure. This disclosure also relates to a system for characterizing a substrate and a method for measuring a characteristic of a substrate employing the measurement device.

Method, device and system for measuring an electrical characteristic of a substrate

The invention relates to a process for manufacturing a multilayer structure made from semiconducting materials that include an active layer, a support layer and an electrically insulating layer between the active layer and the support layer. The process includes the step of modifying the density of carrier traps or the electrical charge within the electrically insulating layer in order to minimize electrical losses in the structure support layer.

Growing community of inventors

Louvain-la-Neuve, Belgium

Jean-Pierre Raskin