Commissariat a L'energie Atomique

Jean-Pierre Gailliard

Aime Perrin

Alain Million

Yves Demay

Jean Piaguet

Apparatus and method for depositing on the flat surface (4) of a substrate (1) a layer of uniform thickness of particles emitted by a source (5). The substrate (1) is held at the extremity of a radial arm (2) which arm in turn is carried on a rotating axis (3). The substrate also rotates on the arm (2) and is carried on the arm so that the flat surface (4) is orientated such that a line drawn normal to the flat surface forms an angle (.theta.) with the axis (3). The apparatus is particularly suited for the production of optical parts.

Device to cover a flat surface with a layer of uniform thickness

It comprises a vaporization chamber containing the material to be vaporized and provided with at least one opening with a given cross-section for maintaining the material to be vaporized in the liquid state within said chamber and for emitting controlled flow molecular beams, a sleeve integral with the vaporization chamber surrounding the opening or openings having a given cross-section, heating means for maintaining the vaporization chamber isothermal and for obtaining an adequate temperature in the sleeve to prevent condensation of the vaporized material in said sleeve and in the opening or openings having a given cross-section.

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Grenoble, France

Jean-Pierre Gailliard