Commissariat &#xc0; L'&#xc9;nergie Atomique Et Aux &#xc9;nergies Alternatives

Horiba Jobin Yvon Sas

Horiba France Sas

Jean-Paul Gaston

Olivier Acher

Simon Richard

Olivier Sublemontier

Patrick Chapon

Youri Rousseau

Christian Petit

Alain Billard

Alexander Podzorov

Thanh-Liem Nguyen

Christophe Muller

Pascal Briois

Frédéric Perry

Brice Villier

Géraldine Melizzi

A device () for coating a substrate () with nanometric sized particles, wherein the device comprises: a plurality of aerodynamic lenses able to product a jet () of nanometric sized particles, each of the aerodynamic lenses having a longitudinal axis, the aerodynamic lenses being arranged so that the various longitudinal axes are parallel and oriented in a first direction (X) defining the direction of propagation of the jet and in the form of at least two columns () offset from each other in a second direction (Y) orthogonal to the first direction, where the first and the second column each comprise at least one of the aerodynamic lenses, the at least one of the aerodynamic lenses of the first column also being offset relative to the at least one of the aerodynamic lenses of the second column in a third direction (Z) that is both orthogonal to the first direction and to the second direction.

Device for depositing nanometric sized particles onto a substrate

Disclosed is an ellipsometer or scatterometer including a light source, a polarizer, an optical illumination system suitable for directing an incident polarized light beam towards a sample, a wavefront-division optical beam splitter arranged to receive a secondary light beam produced by reflection, transmission or diffraction, the wavefront-division optical beam splitter being oriented to form three collimated split beams, an optical polarization modification device and an optical polarization splitting device to form six angularly split beams, a detection system suitable for detecting the six split beams, and a processing system suitable for deducing therefrom an ellipsometric or scatterometric measurement.

Instantaneous ellipsometer or scatterometer and associated measuring method

A glow discharge spectrometry system includes a glow discharge lamp suitable for receiving a solid sample () and forming a glow discharge etching plasma (). The system () for measuring in situ the depth of the erosion crater generated by etching of the sample () includes an optical separator (), optical elements () suitable for directing a first incident beam () toward a first zone () of the sample, the first zone being exposed to the etching plasma, and a second incident beam () toward a second zone () of the same side of the sample, the second zone being protected from the etching plasma, respectively, and an optical recombining device () suitable for forming an interferometric beam () so as to determine the depth (d) of the erosion crater.

Glow discharge spectroscopy method and system for measuring in situ the etch depth of a sample

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Vert le Grand, France

Jean-Paul Gaston