Sidel Participations

Jean-Michel Rius

Guy Feuilloley

Yves-Alban Duclos

Nicolas Chomel

Yann Pernel

A machine for plasma treatment of containers, including a chamber for receiving a container to be treated, the chamber connected to a primary vacuum circuit. A pressure sensor is connected to the chamber. There is a first mechanism for communicating the pressure sensor with the chamber; a secondary vacuum circuit dependent on the first circuit and connected to the pressure sensor; and second mechanism for communicating the pressure sensor with the secondary vacuum circuit.

Machine for plasma treatment of containers comprising an integrated vacuum circuit

An apparatus () for PECVD deposition of a thin layer of a barrier-effect material in a receptacle (), the apparatus comprising: a structure () receiving the receptacle (), said structure () defining a plasma-presence zone (), said structure () being provided with an orifice () defining an axis (A) and presenting an inside opening () opening out into the plasma-presence zone (), and an outside opening () opening out outside said zone (); an electromagnetic wave generator; and an optical plasma monitor device () including a pick-up () placed outside the plasma-presence zone () on the axis (A) of said orifice.

Apparatus for PECVD deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device

The present invention relates to a gas feed installation for depositing barrier layers in a container. According to the invention, a balancing step is carried out using a start-up feed device () during transient states when the operation passes from a vacuum step, then to a step of depositing a preparatory layer and finally a step of depositing an actual barrier layer on an injector () inside a container ().

Gas feed installation for machines depositing a barrier layer on containers

A device for plasma depositing a thin film of a barrier material on an internal wall of a container includes: an electromagnetic wave generator; a cavity connected to the generator and made of a conductive material; a chamber positioned in the cavity and made of a material that is transparent to electromagnetic waves coming from the generator; and openings made in the cavity and oriented parallel to one another.

Cooled device for plasma depositing a barrier layer onto a container

Device for depositing a coating on an internal surface of a container, of the type in which the deposition is carried out by means of a low-pressure plasma created inside the container by excitation of a precursor gas by microwave-type electromagnetic waves. An injection tube is provided that dips into the container to a length of between one quarter and one half of the total height of the container in question, between the top and the bottom of the container said length of the injection tube constituting a longitudinal antenna capable of picking up a UHF electromagnetic wave generated by said generator and of propagating the HT ignition signal, a UHF short-circuit in the form of a plate being provided on the injection tube in such a way that the face of said plate on the cavity side defines a point of zero amplitude of the electromagnetic wave propagating along said injection tube, the length between said short-circuit and the free end of said injection tube corresponding to an odd number of quarter-wavelengths so as to obtain a maximum amplitude, that is to say an antinode, at the free end of the injection tube.

Device for depositing a coating on an internal surface of a container

A machine () for depositing a thin layer of a barrier-effect material inside a container () by plasma-enhanced chemical vapor deposition, said machine () comprising: a processing unit () receiving the container () and equipped with an electromagnetic wave generator (); a precursor gas outlet (); an injector () for injecting said precursor gas into the container (), said injector () having a bottom end () that opens out into the container () and an opposite top end (); a precursor gas feed duct () that puts the precursor gas outlet () into fluid flow connection with the top end () of the injector (); and a solenoid valve () interposed in the feed duct () between the precursor gas outlet () and the injector (), immediately upstream from the top end () of the injector ().

Apparatus for plasma-enhanced chemical vapor deposition (PECVD) of an internal barrier layer inside a container, said apparatus including a gas line isolated by a solenoid valve

The deposition of a coating on a thermoplastic container surface using low pressure plasma by excitation of a precursor gas with UHF electromagnetic waves in a circular shaped vacuum cavity receiving the container is provided. It includes dimensioning the cavity with respect to the frequency of the UHF electromagnetic waves so as to obtain a coupling mode generating several electromagnetic fields inside the cavity. In particular a TM 120 coupling mode is provided which generates two central fields () inside the cavity, whereby two containers can be simultaneously treated in said cavity.

Growing community of inventors

Octeville sur Mer, France

Jean-Michel Rius