Freescale Semiconductor,inc.

Nxp Usa, Inc.

Jean Michel Reynes

Beatrice Bernoux

Rene Escoffier

Pierre Jalbaud

Ivana Deram

Alain Deram

Evgueniy Stafanov

Yann Weber

Blandino Lopes

Joel Margheritta

Graeme John Anderson

Dale Neil Vaughan

Stéphane Alves

A power field effect transistor, a power field effect transistor device and a method of manufacturing a power field effect transistor are provided. During the manufacturing of the power field effect transistor, a body drive stage to manufacture the body region of the power field effect transistor is shortened to obtain a relatively low on resistance for the power field effect transistor. Before the implanting stage of the dopants of the body region, a pre body drive stage is introduced. During the pre body drive stage and the body drive stage sidewalls of a polysilicon layer of the power field effect transistor are oxidized to obtain a power field effect transistor which has at the sidewalls an oxidized polysilicon layer that is thick enough to prevent a premature current injection from the gate to the source regions of the power field effect transistor.

Power field effect transistor, a power field effect transistor device and a method of manufacturing a power field effect transistor

A transistor power switch device comprising an array of vertical transistor elements for carrying current between first and second faces of a semiconductor body. The device also comprises a semiconductor monitor element comprising first and second semiconductor monitor regions in the semiconductor body and a monitor conductive layer distinct from the current carrying conductive layer of the transistor array. The semiconductor monitor element presents semiconductor properties representative of the transistor array. Characteristics of the semiconductor monitor element are measured as representative of characteristics of the transistor array. Source metal ageing of a transistor power switch device is monitored by measuring and recording a parameter which is a function of a sheet resistance of the monitor conductive layer when the transistor power switch device is new and comparing it with its value after operation of the device. A measured current is applied between a first location on an elongate strip element of the monitor conductive layer and a first location on one of a pair of lateral extensions of the strip, and the corresponding voltage developed between a second location on the elongate strip element and the other of said pair of lateral extensions is measured.

Transistor power switch device and method of measuring its characteristics

A transistor power switch device comprising a semiconductor body presenting opposite first and second faces, an array of vertical field-effect transistor elements for carrying current between the first and second faces is provided. The array of transistor elements comprises at the first face an array of source regions of a first semiconductor type, at least one body region of a second semiconductor type opposite to the first type interposed between the source regions and the second face, at least one control electrode for switchably controlling flow of the current through the second transistor region, and a conductive layer contacting the source regions and insulated from the control electrode by at least one insulating layer.

Power MOS transistor device

A method of forming a power semiconductor device comprises forming a first semiconductor layer of a first conductivity type extending across the power semiconductor device; forming an epitaxial layer of the first conductivity type over the first semiconductor layer, the epitaxial layer having a doping concentration that increases from a first surface of the epitaxial layer towards the first semiconductor layer; forming a body region of a second conductivity type in the epitaxial layer extending from the first surface of the epitaxial layer into the epitaxial layer, wherein a junction between the body region and the epitaxial layer is at or substantially adjacent to a region of the epitaxial layer having a maximum doping concentration; and forming a gate region such that the gate region is adjacent at least a portion of the body region. In operation of the semiconductor device, the portion of the body region adjacent the gate region functions as a channel region of the semiconductor device.

Method of forming a power semiconductor device and power semiconductor device

A transistor power switch device comprising an array of vertical transistor elements for carrying current between the first and second faces of a semiconductor body and a vertical avalanche diode electrically in parallel with the array of vertical transistors. The array of transistor elements includes at the first face an array of source regions of a first semiconductor type, at least one p region of a second semiconductor type opposite to the first type interposed between the source regions and the second face, at least one control electrode for switchably controlling flow of the current through the p region, and a conductive layer contacting the source regions and insulated from the control electrode. The vertical avalanche diode is configured to conduct breakdown current between the first and second faces in the off state of the device and having a first current carrying diode region of the second semiconductor type in contact with the first face and with the conductive layer and a second semiconductor region of the first semiconductor type electrically connected with the second face.

Power MOS transistor device and switch apparatus comprising the same

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Pompertuzat, France

Jean Michel Reynes