Altatech Semiconductor

Other

S.o.i.tec Silicon on Insulator Technologies

Unity Semiconductor Corporation

Kobus Sas

Kobus

Jean-Luc Delcarri

Christophe Maleville

Philippe Gastaldo

Julien Vitiello

Fabien Piallat

Christophe Borean

François Berger

Cécile Moulin

Sophie Moritz

Patrice Belin

A method for removing a metallic deposit disposed on a surface in a chamber, including the following steps:

Method for removing a metal deposit placed on a surface in a chamber

Device for treating substrates, comprising a changer having controlled pressure and temperature, a substrate support which is provided in the chamber, the chamber comprising a gas inlet for carrying out a vapor phase deposition, and an upper wall of the chamber provided with a plurality of first channels connected to a first inlet and a plurality of second channels connected to a second inlet, the first and second channels opening into the chamber and being regularly distributed in the upper wall, a heating element provided above the upper wall and a gas discharge ring provided between the upper wall and the substrate support, the upper wall begin electrically conductive and insulated relative to the substrate support so as to be able to apply a voltage between the upper wall and the substrate support.

Device and process for chemical vapor phase treatment

A method for detecting surface defects, such as slip line type defects, on a substrate designed to be used in electronics, optoelectronics or analogue, including projection of a pattern of light fringes and dark bands onto the substrate, relative displacement of the substrate relative to the pattern, acquisition of a sequence of at least three images of the pattern reflected by the substrate to a sensor, the images corresponding to displacement of the fringes of the pattern, determination of the gradient of the surface of the substrate using displacements of fringes of the pattern, and determination of the presence of a surface defect on the substrate using variations in the gradient of the surface of the substrate. Another embodiment comprises a device using said method.

Method for detecting surface defects on a substrate and device using said method

Growing community of inventors

Saint Ismier, France

Jean-Luc Delcarri