Samsung Electronics Co., Ltd.

Je Hoon Oh

Jae Hee Lee

Ki Chul Kim

Yong Hun Lee

Pyung Moon

Sung Ho Kang

Yong Seok Song

Hang Mook Park

Un Ki Kim

A plasma monitoring device includes a fixing unit, a plasma measuring unit disposed to be in contact with the fixing unit, and measuring a luminous intensity of emitted light of a plasma to output a luminous intensity measurement value, a reference light source unit irradiating reference light having a uniform luminous intensity to the plasma measuring unit, and a control unit receiving the luminous intensity measurement value to calculate a luminous intensity value of the emitted light, controlling a voltage applied to the reference light source unit to uniformly control a luminous intensity of the reference light, comparing a luminous intensity of the reference light irradiated to the plasma measuring unit with a previously stored luminous intensity reference value to detect a correction factor, and applying the correction factor to a luminous intensity value of the emitted light to correct the luminous intensity measurement value.

Plasma monitoring device

Growing community of inventors

Seoul, South Korea

Je Hoon Oh