Westar Photonics Inc.

Jay J Brandinger

Brian Hoffman

Edward Polkowski

Zino Altman

A maskless patterning apparatus allows for laser beam ablation of one or more layers of material while not etching an underlying different material layer. A micromirror array produces the desired complex pattern on the workpiece and a continuous feature and end point detection system provides location and material parameter changes to accurately control the pattern position and depth of etching. End point detection includes monitoring energy reflected from a specially prepared replica of the material to be ablated, whose thickness and consistency match the active workpiece area. The process terminates when the proper amount of material is removed.

Maskless laser beam patterning ablation of multilayered structures with continuous monitoring of ablation

There is provided a system and method for ablating a surface of a work-piece comprising a radiation source for providing an ablating beam and a plurality of adjustable reflective masks having predetermined mask patterns thereon. The reflective masks are sequentially positioned relative to said radiation source and in the path of said ablating beam for reflecting said ablating beam onto the surface of the work-piece to ablate the work-piece.

Method, system and product for producing a reflective mask mirror and for ablating an object using said reflective mask mirror

A programmable apparatus for laser beam shaping including a preprogrammable mircomirror array produces a spatial energy distribution suitable for accurately and rapidly marking, machining and processing materials. The preprogrammed micromirror array redistributes the laser output beam energy to produce a desired two-dimensional machining pattern on a work piece. The energy pattern created by the preprogrammed micromirror array is changeable between successive pulses of the laser to create accurate, complex three-dimensional machined shapes in a work piece not easily achieved by conventional machining systems. A special application of this invention is laser beam shaping to produce a uniform spatial energy distribution, i.e. homogenizing the beam from a laser with non-uniform energy distribution. Continuous adjustment of beam shaping is provided to maintain beam homogenization in accordance with changes in laser beam output energy profile.

Laser beam shaping device and apparatus for material machining

A laser machining device is capable of simultaneously machining two- or three dimentional patterns on the surface of a workpiece. A micromirror array positioned within a laser cavity generates a patterned plurality of laser beamlets which can be homogenized and deflected by a second micromirror array onto the surface of a workpiece to create a two-dimensional pattern. Alternatively, the second micromirror array can deflect laser beamlets of unequal energy density to produce a three-dimensional pattern.

Modulation of laser energy with a predefined pattern

A method for making accurate and precise customized corrections to the surface of an optical lens is described. An electronic correction contour is generated from a measured refractive correction for a patient, and transferred to the surface of the lens by ablation etching with one or more laser pulses. After each of the laser pulses, the refractive properties of the lens are measured and compared to the electronic contour correction derived from a patient's refractive correction. The ablation etching is terminated in localized areas where the refractive properties match the electronic correction contour. End point detection includes monitoring refractive qualities of the lens during the recontouring process, modifying the pattern through changes in the laser pulses.

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Pennington, NJ, United States of America

Jay J Brandinger