Taiwan Semiconductor Manufacturing Comp. Ltd.

Jau-Shian Liang

Hua-Tai Lin

Ming-Hui Chih

Chien-Wen Lai

Wen-Chen Lu

Chin-Min Huang

Chia-Cheng Chang

Cherng-Shyan Tsay

The present disclosure relates to a method of performing an optical proximity correction (OPC) procedure that provides for a high degree of freedom by using an approximation design layer. In some embodiments, the method is performed by forming an integrated chip (IC) design having an original design layer with one or more original design shapes. An approximation design layer, which is different from the original design layer, is generated from the original design layer. The approximation design layer is a design layer that has been adjusted to remove features that may cause optical proximity correction (OPC) problems. An optical proximity correction (OPC) procedure is then performed on the approximation design layer. By performing the OPC procedure on the approximation design layer rather than on the original design layer, characteristics of the OPC procedure can be improved.

OPC method with higher degree of freedom

Growing community of inventors

Taipei, Taiwan

Jau-Shian Liang