Cadence Design Systems, Inc.

Ipventure, Inc.

Jason Sweis

David Yinkai Chao

Zhiyang Guo

Vivian Liane Rice

Abdurrahman Sezginer

David Cooke Noice

Vassilios Constantinos Gerousis

Eric S Hussey

Grace C Sheen

Sozen Yao

Embodiments for systems, methods and apparatuses of eyewear are disclosed. One method includes treating a patient with shutter glasses therapy for a relatively short period of time, such as at least a 6 week period; wherein the shutter glasses therapy includes blanking a first lens of shutter glasses being worn by the patient for a first blocking time, blanking a second lens of the shutter glasses being worn by the patient for a second blocking time, and controllably setting at least one of the first blocking time and the second blocking time.

Electronic eyewear therapy

Apparatuses and methods of shuttering glasses are disclosed. One apparatus includes a first lens operable to blank for a first blocking time, a second lens operable to blank for a second blocking time, and a controller for controllably setting at least one of the first blocking time and the second blocking time.

Shutter eyewear

A system and method provide semiconductor fabrication mask creation techniques that align the device features patterned with a first core mask with one or more pad features patterned with a subsequent pad mask. Shapes representing the pad features may be included in the core mask by reducing on all sides, the shape of the pad feature in the core mask by the width of the spacer material. A pad mask then may be created to include a shape of the pad feature that may overlap a portion of the spacer material pattern created by the shape of the pad feature in the core mask. Data sets may be generated from a circuit design to create the masks that may be fabricated with the described techniques.

System and method for self alignment of pad mask

Disclosed are a method, apparatus, and program product for routing an electronic design using double patterning that is correct by construction. The layout that has been routed will by construction be designed to allow successful manufacturing with double patterning, since the router will not allow a routing configuration in the layout that cannot be successfully manufactured with double patterning.

Method, system, and program product for routing an integrated circuit to be manufactured by doubled patterning

Disclosed is a method, system, and computer program product for implementing controlled breaks using sub-resolution assist features. Sub-resolution bridging features are added to implement controlled breaks between features on the layout. The bridging features may also be used to facilitate or optimize multiple mask/exposure techniques that split a layout or features on a layout to address pitch problems.

Growing community of inventors

San Jose, CA, United States of America

Jason Sweis