Lam Research Corporation

Nanometrics Inc.

Astrazeneca Ab

Jason Shields

Andrew J Hazelton

Jason Grant Kettle

Ye Feng

Dedong Wu

Frederick Woolf Goldberg

Neil Patrick Grimster

Rajan Arora

Tyler Grebe

Nir Ben Moshe

Li Sha

Adelphe Mfuh

Ye Wu

Amber Balazs

Robert Evans Ziegler

Anthony Metrano

Kun Song

Randolph Escobar

Lucas Morrill

Sten Nilsson Lill

Kathryn Giblin

A metrology system for substrate processing includes an optical metrology station including a plurality of optical sensors to measure spectra from a plurality of measurement locations on a substrate. A plurality of fiber cables are connected to the plurality of optical sensors. A spectrometer is selectively connected to the plurality of fiber cables. A mass metrology station measures at least one of a mass or mass change of the substrate. A controller includes a modelling module to generate thickness values at the plurality of measurement locations based on the spectra from the plurality of measurement locations and a learned model. A spatial modelling module generates a spatial thickness distribution model for the substrate based on the thickness values at the plurality of measurement locations from the modelling module and the at least one of the mass or the mass change from the mass metrology station.

Systems and methods for combining optical metrology with mass metrology

A cover plate or lens for an optical metrology device that is positioned under a wafer during measurement is protected with a purge device. The purge device may include a ring that extends around a periphery of the cover plate or lens. The ring includes a plurality of apertures through which a purge gas or air is expelled over the surface of the cover plate or lens. Additionally or alternatively, one or more heating elements may be provided that extend around the periphery of the cover plate or lens. The heating elements heat the cover plate above a dewpoint temperature of contaminant vapor. A heat sensor may be used to monitor the temperature of the cover plate to control the heating elements and/or to compensate for optical changes of the cover plate caused by heating during measurement of a wafer.

Protected lens cover plate for an optical metrology device

Growing community of inventors

Pleasanton, CA, United States of America

Jason Shields