Other

American Air Liquide, Inc.

Air Liquide America, L.p.

Jason R Uner

Thierry Sindzingre

Gregory M Jursich

John P Borzio

Derong Zhou

Earle R Kebbekus

Martin Theriault

Stephane Rabia

Claude Carsac

The apparatus and method of the present invention relates use a dry atmosphere in the component storage portion of the surface mount device placement machine. The dry atmosphere provides the benefit of eliminating the baking process and other moisture management issues. In accordance with one aspect of the present invention, a component placement machine for placing components on printed circuit boards includes a component storage area, a component placement system for taking components from the component storage area and placing the components on the printed circuit boards, an enclosure surrounding the component storage area, and a dry gas delivery system for delivery of a dry gas to the storage area to prevent moisture from being absorbed by the components.

Apparatus and method for maintaining a dry atmosphere in a surface mount device placement machine

Apparatus for placing components on printed circuit boards

This invention is related to a method for encapsulating bond regions in electronic components comprising, for example, metallic bond regions, the method comprising the steps of exposing an electronic component having at least one bond region through a primary gas atmosphere comprising unstable or excited gaseous species, the gaseous species being substantially devoid of any electrical charges, the primary gas atmosphere having a pressure ranging from about 0.5&times;10 Pa to about 3.0&times;10 Pa, thereby forming a treated, non-encapulated electronic component, then encapsulating the electronic component.

Systems and methods for application of substantially dry atmospheric plasma surface treatment to various electronic component packaging and assembly methods

Processes are disclosed for increasing the condensed phase production of BCl comprising less than about 10 ppm phosgene, less than 10 ppm chlorine, and less than 10 ppm HCl. In one embodiment the process comprises injecting an inert gas into a container having condensed BCl therein, the condensed BCl having therein a minor portion of phosgene impurity. A major portion of the phosgene in the condensed BCl is decomposed to carbon monoxide and chlorine by increasing temperature to produce a phosgene deficient stream. The temperature of the phosgene deficient stream is then decreased, and contacted with an adsorbent to remove the chlorine in the stream by adsorption to form a chlorine and phosgene free condensed stream. The chlorine and phosgene free stream is stripped using an inert gas to form a BCl product condensed stream, and an inert gas is used to pump the BCl product condensed stream to a product receiver.

Systems for purification of boron trichloride

Processes are disclosed for increasing the condensed phase production of BCl,comprising less than about 10 ppm phosgene, less than 10 ppm chlorine, and less than 10 ppm HCl. In one embodiment the process comprises injecting an inert gas into a container having condensed BCl,therein, the condensed BCl,having therein a minor portion of phosgene impurity. A major portion of the phosgene in the condensed BCl,is decomposed to carbon monoxide and chlorine by increasing temperature to produce a phosgene deficient stream. The temperature of the phosgene deficient stream is then decreased, and contacted with an adsorbent to remove the chlorine in the stream by adsorption to form a chlorine and phosgene free condensed stream. The chlorine and phosgene free stream is stripped using an inert gas to form a BCl,product condensed stream, and an inert gas is used to pump the BCl,product condensed stream to a product receiver.

Process and systems for purification of boron trichloride

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Chicago, IL, United States of America

Jason R Uner