Texas Instruments Corporation

Jason Michael Neidrich

Lisa Ann Wesneski

Simon Joshua Jacobs

Larry J Hornbeck

Patrick Ian Oden

Lance W Barron

Cuiling Gong

Matthew Glen Hine

Judith C Frederic

Robert L Adams

Linda M Wills

William D Carter

Paul G Sudak

A system and method for exposing different parts of a single field of view for various and differing lengths of time while capturing an image is provided. For astrophotography, unwanted light pollution or over-saturation bleeding from nearby or obtrusive stars may be greatly reduced or eliminated while still capturing the image of the nearby brighter star in the same field of view. Also, a system and method for real-time contrast control while capturing an image to optimize signal-to-noise ratio for various parts of the captured image, is provided. An embodiment of the present invention provides such techniques by using spatial light modulator devices, such as a digital micro-mirror device, to controllably mask different portions of light from an image that expose film or a charge-coupled device. A system and method for a way to use a spatial light modulator device as an active and controllable mask for photolithography, is provided.

System and method for varying exposure time for different parts of a field of view while acquiring an image

A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark polymer material, and roughening a top surface of the dark polymer material. The roughening can be achieved by ashing the dark polymer material in an ash chamber. The dark polymer material, preferably a black matrix resin or a polyimide black matrix resin, when ashed in an oxygen rich atmosphere for a short period of time, forms a surface that is capable of absorbing light as well as randomly refracting light it does not absorb. A protective cap layer may be formed on top of the ashed dark polymer material to provide protection for the dark polymer material.

Ultra dark polymer

Methods and apparatus for rendering plural channels on a common display are provided. In a method embodiment, a method for allowing sharing of a display by a plurality of users wishing to view a plurality of respective images includes displaying the plurality of respective images sequentially on the display. The method further includes selectively allowing the respective image to be viewed by the respective user, but not by any other of the plurality of users.

Method and system for multi-channel viewing applications

In accordance with the teachings of the present invention, a spatial light modulator mirror metal having enhanced reflectivity is provided. In a particular embodiment of the present invention, a light processing system includes a light source operable to provide a light beam along a light path and a spatial light modulator positioned in the light path, the spatial light modulator comprising an array of pixel elements, each pixel element comprising a deformable micro-mirror operable to reflect the light beam in at least one direction. At least a portion of each deformable micro-mirror comprises an Al&#x2014;Cu alloy. A controller electrically connected to the spatial light modulator is operable to provide electrical signals to the spatial light modulator to cause the spatial light modulator to selectively deform the pixel elements, thereby selectively reflecting incident light beams along a projection light path.

Spatial light modulator mirror metal having enhanced reflectivity

According to one embodiment of the present invention, a semiconductor device includes a first layer of dielectric material disposed upon an upper surface of a substrate of a semiconductor device and a first non-conductive layer of metal disposed upon an upper surface of the dielectric material. The first layer of dielectric material and the first non-conductive layer of metal act as an optical trap for electromagnetic radiation received by the first non-conductive layer of metal. In particular embodiments, the semiconductor device may further comprise a second layer of dielectric material disposed upon an upper surface of the first non-conductive layer of metal and a second non-conductive layer of metal disposed upon an upper surface of the second layer of dielectric material.

Antireflective coating for semiconductor devices and method for the same

System and method for detecting and imaging radiation. A preferred embodiment comprises a substrate with electronic circuitry to detect changes in a transduction signal, an intermediate conductive layer disposed above and electrically connected to the electronic circuitry, and a lower separation layer with a high coefficient of thermal resistance that partially separates the intermediate conductive layer from the electronic circuitry. The preferred embodiment also includes a top layer disposed above the intermediate conductive layer and an absorptive layer overlying the top layer, with the absorptive layer being electrically connected to the intermediate conductive layer. The absorptive layer produces a transduction signal that is proportional to an amount of radiation incident on the absorptive layer. The vertical fabrication of the radiation sensor allows for sensor arrays with a good fill factor, permitting the creation of sensor arrays with high resolution while maintaining low costs.

System and method for radiation detection and imaging

According to one embodiment of the present invention, a semiconductor device includes a first layer of dielectric material disposed upon an upper surface of a substrate of the semiconductor device, a first layer of metal disposed upon an upper surface of the first layer of dielectric material, and a thick film anti-reflective layer having a thickness of at least about one micron disposed upon an upper surface of the first layer of metal.

Isolation layer for semiconductor devices and method for forming the same

A method of tilting a micromirror includes forming a substrate, a micromirror outwardly from the substrate, and at least one electrode inwardly from the micromirror. The method further includes applying, by the at least one electrode, electrostatic forces sufficient to pivot the micromirror about a pivot point. In addition, the method includes providing the at least one electrode with a sloped outer surface. The sloped outer surface has a first end and a second end. The second end is closer to the pivot point than the first end, and the first end is closer to the substrate than the second end. The method also includes providing at least a portion of the at least one electrode with material properties that at least partially contribute to the sloped profile of the sloped outer surface.

Growing community of inventors

Fairview, TX, United States of America

Jason Michael Neidrich