Asml Netherlands B.v.

Cymer, Inc.

Trumpf Lasersystems for Semiconductor Manufacturing Gmbh

Jason Michael Arcand

Yezheng Tao

Andrew David LaForge

John Tom Stewart, Iv

Robert A Bergstedt

Martin Lambert

Alexander Anthony Schafgans

Daniel Brown

Jordan Jur

Christopher Paul Pate

Michael Anthony Purvis

Jesse Quinn Odle

Christopher P Pate

An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.

Extreme ultraviolet light source

A system for an EUV light source includes a metrology light source configured to emit a metrology light beam; and an optical beam combiner positioned to receive the metrology light beam and at least one other light beam and to direct the metrology light beam and the at least one other light beam onto a beam path toward a target region. After interacting with the optical beam combiner, the metrology light beam and the at least one other light beam have the same polarization state.

Metrology system for an extreme ultraviolet light source

Focus of a laser optical system can be corrected using a variable radius mirror having a focusing cavity and a separate cooling cavity. Pressure of a focusing material at a sufficiently low mass flow in the focusing cavity deforms a reflective surface mounted to the focusing cavity, changing its radius. Cooling material provided to the cooling cavity cools the variable radius mirror. A laser beam is reflected by the deformed reflecting surface to focusing optics, focusing the reflected laser beam on an EUV-emitting target, and minimizing a laser focus error by one or more of: maximizing a measured EUV power or minimizing a measured laser beam divergence. Providing focusing material at a deformation pressure and at a sufficiently low mass flow, and providing a separate cooling cavity, avoids perturbations in the reflective surface which would otherwise affect laser beam focus.

System and method for correcting the focus of a laser beam

A dichroic beam splitter module is disclosed for separating a main pulse laser beam from a pre-pulse laser beam each traversing a common beam path. In one embodiment, two dichroic elements are physically aligned along the beam path and are configured to pass the pre-pulse, a laser light having a first wavelength, to target material located near an irradiation site yet reflect the main pulse, a laser light having a second wavelength. The reflected main pulse is then further reflected by two reflective elements or mirrors from the first dichroic element to the second dichroic element and then on to the irradiation site. In alternative embodiments, the first mirror is deformable to alter beam characteristics of the reflected main pulse beam and the second mirror is adjustable to align the main pulse beam to the irradiation site.

System and method for separating a main pulse and a pre-pulse beam from a laser source

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Escondido, CA, United States of America

Jason Michael Arcand