3m Innovative Properties Company

Jason M Kehren

William M Lamanna

Patricia M Savu

Thomas P Klun

Yu Yang

Suresh Iyer

Jeffrey A Peterson

Richard M Minday

Zai-Ming Qiu

Michael G Costello

Yongshang Lu

Michael J Bulinski

Michael J Parent

Susrut Kesari

Alexandre R Monteil

David J Lundberg

Liping Claryn Ng

Namiko Ikegaya

Matthew J Pinnow

Suresh S Iyer

A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf—S—Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition further includes a coating material that is soluble or dispersible in said solvent.

Deposition compositions and methods of making and using same

An ionic diol has formula wherein Rrepresents an alkyl group having from 6 to 18 carbon atoms; Rand Rindependently represent alkyl groups having from 1 to 4 carbon atoms; Rrepresents an alkylene group having from 2 to 8 carbon atoms; and Rrepresents an alkylene group having from 1 to 8 carbon atoms. Antistatic polymers are formed by copolymerization of monomers including a diisocyanate, an ionic diol, a polyether diol, and at least one non-ionic diols. Methods of making the antistatic polyurethanes are also disclosed. 

Ionic diol, antistatic polyurethane, and method of making the same

Antistatic polymers include divalent segments represented by the formula wherein Rrepresents an alkyl group having from 6 to 18 carbon atoms, Rand Rrepresent alkyl groups having from 1 to 4 carbon atoms, and Rrepresents an alkylene group having from 2 to 8 carbon atoms. Methods of making antistatic polymers are also disclosed. 

Antistatic polymers and methods of making the same

Antistatic polymers include divalent segments having the formulas (I) and (II) and wherein Rrepresents an alkyl group having from 1 to 18 carbon atoms, Rand Rrepresent alkyl groups having from 1 to 4 carbon atoms, Rrepresents an alkylene group having from 2 to 8 carbon atoms, and Rindependently represents H or methyl. Methods of making antistatic polymers are also disclosed. 

A composition includes a fluorinated or perfluorinated organic solvent, and a fluorinated surfactant of the general formula (1): [Formula should be inserted here] Rf is a perfluoroalkyl group having 1-6 carbon atoms. Each occurrence of Rand Ris independently H or CH, n is 1-3, and x is 1-3. 

Fluorinated surfactant containing compositions

Anionic surfactants have a formula:RSON(H)&#x2014;CHCH(CH)OH; orRSON(H)&#x2014;(CHCHO)H, whereis an integer from 2-6. Ris a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula:RSON[CHCH(CH)OH];&#x2003;&#x2003;(a)RSON[CHCH(CH)OH][(CHCHO)H], whereis an integer from 1-6;&#x2003;&#x2003;(b)RSON(R)[(CHCHO)H], whereis an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or&#x2003;&#x2003;(c)RSON[(CHCHO)H][(CHCHO)H], whereis an integer from 1-6 andis an integer from 3-6. Ris a fluoroalkyl group having 3 to 8 carbon atoms.&#x2003;&#x2003;(d)

Surfactants and methods of making and using same

A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: RS0NH&#x2014;R' where R=CF&#x2014; and n=1 to 6, R&#x2032;=&#x2014;H, &#x2014;CH, and &#x2014;CHCHOH. The aqueous ionic surfactant solution has a pH of within about 3 pH units of a pKa of the perfluoroalkyl sulfonamide.

Perfluoroalkyl sulfonamides surfactants for photoresist rinse solutions

Anionic surfactants have a formula: RSON(H)&#x2014;CHCH(CH)OH; or RSON(H)&#x2014;CHCHO)H, where x is an integer from 2-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: (a) R&#x2014;SON[CHCH(CH)OH]; (b) RSON[CHCH(CH)OH][(CHCHO)H], where n is an integer from 1-6; (c) RSON(R)[(CHCHO)H], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or (d) RSON[(CHCHO)H][(CHCHO)H], where q is an integer from 1-6 and m is an integer from 3-6. Ris a fluoroalkyl group having 3 to 8 carbon atoms.

The present disclosure relates to high purity apparati, e.g., magnetic hard disk drives, and more specifically, to coatings for particle reduction of surfaces of such apparati. The provided coatings include thin polymer coatings with reactive pendant groups having crosslinking functionality and ability to anchor to substrate surfaces to suppress particle shedding from substrate surfaces. Provided is a substrate that includes a coating on at least a portion of the substrate that comprises a fluorinated acrylate random copolymer. Methods of reducing particulate contamination are also provided.

Coatings and methods for particle reduction

A lubricant composition comprising a perfluoropolyether lubricant and fluorinated ketone solvent is described. The lubricant composition can be applied as a coating to a substrate such as magnetic media. After the coating dries, a thin uniform lubricant film covers the substrate surface. The fluorinated ketone solvent can solubilize a wide range of perfluoropolyether compounds but not potential contaminants such as water and hydrocarbons. Additionally, the solvent has low potential to adversely affect global warming.

Fluorinated ketones as lubricant deposition solvents for magnetic media applications

A method for cleaning a vapor reactor by applying a liquid cleaning agent comprising a fluorinated ketone having about 5 to about 10 carbon atoms and up to two hydrogen atoms is described. The fluorinated ketone has low global warming potential.

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Stillwater, MN, United States of America

Jason M Kehren