Asml Holding N.v.

Asml Netherlands B.v.

Spot on Networks, LLC

Jason Douglas Hintersteiner

Wenceslao A Cebuhar

Arno Jan Bleeker

Karel Diederick Van Der Mast

Azat M Latypov

Gerald Theodore Volpe

Patricius Aloysius Jacobus Tinnemans

Pieter Willem Herman De Jager

Kars Zeger Troost

Stanislav Y Smirnov

Huibert Visser

Mark L Oskotsky

Lev Ryzhikov

Yuli Vladimirsky

Borgert Kruizinga

Scott Douglas Coston

Lev Sakin

Matthew McCarthy

Bart Snijders

Stan Janik

Richard Sherwin

Tom Doyle

Andrew W McCullough

Minne Cuperus

Richard Carl Zimmerman

Bernardo Kastrup

Ronald Peter Albright

Kamen Hristov Chilov

Ronnie Florentius Van T Westeinde

Solomon S Wasserman

The present disclosure describes systems and methods for creating and/or deploying access points for a wireless network in a multi-unit building or for a private residential neighborhood. Additionally, described herein are methods for operating a wireless network in a multi-unit building that was either deployed according to the concepts described herein or was pre-existing.

System and method for wireless access point layout and network operation

A communications network for providing communications for Group 1 Users, Group 2 Users and a plurality of digitally-controlled appliances is disclosed. Said communications network includes a first switch operatively connected to a server, a router, a second switch, and a third switch. Said second switch is operatively connected to a first access point and a second access point. Said third switch is operatively connected to a third access point and a fourth access point. Said first access point is wirelessly connected to Device A, said second access point is wirelessly connected to Device B, said third access point is wirelessly connected to Device C. Said fourth access point is programmed to allow communications between User F wirelessly connected to said fourth access point and any said Group 1 Users, any said Group 2 Users, any of said plural appliances, said server, and said router.

System and method for network user isolation

An iterative method of producing optimized setpoint data for controlling the actuation of elements of an array of individually controllable elements in a maskless system and systems therefore. The optimization is based on estimation of a device structure that can utilizes one or more of the following factors: the low-pass characteristics of the projection system, the configuration of the illumination system, and the process window properties.

Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data

A dark border region may be integrated with a window covering a patterning device, such that light from an active area of the patterning device passes through the dark border region, while excess light is removed from the system by the dark border region. The dark border region may be, for example and without limitation, a light-absorbing material, a wedged light reflective coating that reflects light out of the lithography system, or an interference grating that causes destructive interference in unwanted light to remove the unwanted light from the system. The dark border region may overlap a similar dark border region located on the surface of on the patterning device to optimize a width of the total dark border region without sacrificing excessive valuable real-estate area on the surface of the patterning device or compromising alignment tolerance levels of the lithography system.

Apertured window for enabling flexible illumination overfill of patterning devices

A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.

Optimal rasterization for maskless lithography

A system and method are used to compensate for distortions or aberrations in an image formed in a projection system. Pattern data is generated corresponding to features to be formed on a substrate. At least one of aberrations and distortions of a projection optical system are measured. The pattern data is altered based on the measuring step. The altered pattern data is transmitted to a patterning device to control individually controllable elements coupled to the patterning device. Non uniformities in one or both of a field and pupil of an illumination system can also be measured and used to alter the pattern data.

Altering pattern data based on measured optical element characteristics

A lithography method is provided. The method includes generating a beam of radiation, patterning portions of the beam of radiation, projecting the patterned beam of radiation towards a substrate, and blocking scattered light from the beam of radiation from the substrate.

Systems and methods for minimizing scattered light in multi-SLM maskless lithography

The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.

A system and method for patterning a beam of radiation based on a pupil field distribution. In an embodiment, the distribution of the field in an area of the pupil plane affecting an image and an illumination mode are selected so as to render an image with desired characteristics. Additionally and/or alternatively, an illumination mode is selected so as to render an image with desired characteristics. The distribution of the field in an area of the pupil plane affecting an image is then realized using the spatial light modulator The system and method include using an illumination system, a pattern generator, and a projector. The illumination system supplies a beam of radiation. The pattern generator patterns the beam of radiation based on a data set corresponding to a field distribution in a pupil plane. The projector projects the patterned beam onto a target portion of an object.

System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode

In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.

Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography

A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.

Maskless lithography systems and methods utilizing spatial light modulator arrays

An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s). Thus, using the PDE and the FDE increases optical efficiency of light impinging on the pattern generator and substantially reduces or eliminates stray light caused by light impinging on undesired areas of the pattern generator.

Efficiently illuminating a modulating device

A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).

System and method for dose control in a lithographic system

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.

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Bethel, CT, United States of America

Jason Douglas Hintersteiner