Asml Netherlands B.v.

Jari Ruotsalainen

Johan Frederik Dijksman

Georgiy Olegovich Vaschenko

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Peter Michael Baumgart

Wilhelmus Henricus Theodorus Maria Aangenent

Koen Gerhardus Winkels

Theodorus Wilhelmus Driessen

Jan Okke Nieuwenkamp

Wim Ronald Kampinga

Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.

Droplet generator for lithographic apparatus, EUV source and lithographic apparatus

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San Diego, CA, United States of America

Jari Ruotsalainen