Micronic Laser Systems Ab

Mycronic Ab

Micronic Mydata Ab

Jarek Luberek

Torbjörn Sandström

Tomas Lock

Lars Stiblert

Patterns are written on workpieces, such as, glass sheets and/or plastic sheets used in, for example, electronic display devices such as LCDs. The workpiece may be larger than about 1500 mm may be used. An optical writing head with a plurality of writing units may be used. The workpiece and the writing head may be moved relative to one another to provide oblique writing.

Writing apparatuses and methods

Devices and methods for manufacturing displays, solar panels and other devices using larger size workpieces are provided. The workpiece is rolled into a cylinder, thereby reducing the physical size by a factor of 3 in one dimension. The stages on which the workpieces are rolled have a cylindrical shape, which allows a more robust and/or compact movement of the glass, reduced machine weight. The workpieces are relatively thin, more flexible, and are rolled onto a cylinder with a diameter of about 1 meter.

Platforms, apparatuses, systems and methods for processing and analyzing substrates

The present disclosure relates to phase-sensitive calibration of an SLM system. In particular, it relates to selecting among local calibrations when there is more than one calibration that satisfies a calibration intensity criteria. It utilizes information available before Fourier filtering, from non-zeroth order diffraction components to counter drift among alternative local calibrations.

Fourier plane analysis and refinement of SLM calibration

The present invention relates to a method for calibrating elements in a spatial light modulator (SLM) as a function of an applied element control signal. A plurality of elements are calibrated simultaneously. A beam of electromagnetic radiation is projected onto at least a part of the SLM. An image of said part of said SLM is formed on a device for measuring intensity of electromagnetic radiation. Element calibrating data is generated by using the intensity data as a function of the applied element control signal by either driving a sub-matrix comprising at least two elements out of said part of the SLM to a sequence of applied element control signals or by seeking out the control signal for each element which give the same predetermined intensity value on the device for measuring the intensity of electromagnetic radiation and stepping through N different predetermined intensity values. The invention also relates to an apparatus for patterning a workpiece having such a calibration method. Other aspects of the present invention are reflected in the detailed description.

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Mölndal, Sweden

Jarek Luberek