Asml Netherlands B.v.

Janneke Ravensbergen

Nitesh Pandey

Duygu Akbulut

Zili Zhou

Jin Lian

Simon Gijsbert Josephus Mathijssen

Sebastianus Adrianus Goorden

Armand Eugene Albert Koolen

Coen Hubertus Matheus Baltis

Bastiaan Onne Fagginger Auer

Patrick Sebastian Uebel

Sebastian Thomas Bauerschmidt

Peter Maximilian GÖTZ

Disclosed is a pupil shaping arrangement for obtaining a defined pupil intensity profile for a metrology illumination beam configured for use in a metrology application. The pupil shaping arrangement comprises an engineered diffuser (ED) having a defined far-field profile configured to impose said defined pupil intensity profile on said metrology illumination beam. The pupil shaping arrangement may further comprise a multimode fiber (MMF) and be configured to reduce spatial coherence of coherent radiation.

Method and apparatus for coherence scrambling in metrology applications

A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.

Metrology apparatus, lithographic system, and method of measuring a structure

A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.

Growing community of inventors

Eindhoven, Netherlands

Janneke Ravensbergen