Kyphon Sarl

Warsaw Orthopedic, Inc.

Janna G Clark

Andrew C Kohm

Hugues Malandain

Samuel S Lee

Thomas A Slater

An apparatus includes a support member and a retention member. The support member has at least a portion configured to be disposed between a first spinous process and a second spinous process. The retention member is movably coupled to an end portion of the support member. The retention member is configured to displace a bodily tissue. The retention member is configured to move relative to the support member from a first position to a second position. The retention member is configured to limit movement of the support member along the longitudinal axis and relative to the first spinous process and the second spinous process when in the second position.

Percutaneous spinal implants and methods

A bone support and/or barrier device and having an implantable structure including an outer surface, an inner surface, a first bone contact portion, and a second bone contact portion. The structure is collapsible to an undeployed configuration capable of percutaneous insertion to the interior of a bone and expandable to a deployed configuration in the bone. In the deployed configuration, the first bone contact portion contacts a first portion of the bone, and the second bone contact portion contacts a second portion of the bone such that a load placed on the first portion of the bone is transferred through the implantable structure to the second portion of the bone. The implantable structure includes a barrier material adapted to restrict bone filler material inserted into the bone adjacent the inner surface of the structure from flowing to the outer surface of the structure. A method is also disclosed.

Bone support device, system and method

An apparatus includes a support member having an outer surface configured to be disposed between adjacent spinous processes and a retention member rotatably coupled to the support member. A first end portion of the retention member is spaced apart from the outer surface by a first distance along an axis substantially normal to a longitudinal axis of the support member when the outer surface is disposed between the adjacent spinous processes. A second end portion of the retention member is spaced apart from the outer surface by a second distance along the axis substantially normal to the longitudinal axis when the outer surface is disposed between the adjacent spinous processes. The first end portion of the retention member and the second end portion of the retention member are configured to cooperatively limit movement of the support member relative to the adjacent spinous processes.

Spinal implants and methods for the placement thereof are disclosed herein. In one variation, the implant includes a support member, a proximal retention member, and a distal retention member. The support member is configured to be disposed between adjacent spinous processes. The proximal retention member has a first configuration in which the proximal retention member is substantially disposed within a proximal portion of the support member, and a second configuration in which a portion of the proximal retention member is disposed outside of the support member. The distal retention member has a first configuration in which the distal retention member is substantially disposed within a distal portion of the support member, and a second configuration in which a portion of the distal retention member is disposed outside of the support member.

Growing community of inventors

Belmont, CA, United States of America

Janna G Clark