Samsung Display Co., Ltd.

Janghyun Kim

Dongmin Lee

Jongoh Seo

Hoon Jong Kang

Minsu Kim

Taewook Kang

Woongsik Kim

Jeongmin Park

Hyeyong Chu

Jongjun Baek

Byungsoo So

Taewoon Cha

Hyunju Kang

Jaewoo Jeong

Provided are a thin-film transistor substrate, a manufacturing method thereof, and a display apparatus. The thin-film transistor substrate includes: a substrate; a buffer layer on the substrate; a semiconductor layer arranged on the buffer layer and including a first conductive area, a second conductive area, and a channel area between the first conductive area and the second conductive area; a first dopant doped in an upper portion of the channel area at a first concentration; a second dopant doped in a lower portion of the channel area at a second concentration and being of a different type from a type of the first dopant; a gate insulating layer covering the semiconductor layer; and a gate electrode overlapping the channel area in a plan view and disposed on the gate insulating layer.

Thin-film transistor substrate, manufacturing method thereof, and display apparatus employing the thin-film transistor substrate

A display apparatus includes a substrate, a gate electrode overlapping the substrate, and a semiconductor layer positioned between the substrate and the gate electrode. The semiconductor layer includes a first layer and a second layer positioned between the first layer and the gate electrode. A hydrogen content of the first layer is greater than a hydrogen content of the second layer.

Display apparatus and method of manufacturing the same

In a method of manufacturing a display apparatus, the method includes: providing a first mother substrate; forming, on the first mother substrate, a pixel layer comprising a light-emitting device; providing a second mother substrate; forming, on the second mother substrate, a diffraction pattern layer configured to diffract light emitted from the light-emitting device; forming a bonded substrate structure by bonding the first mother substrate, on which the pixel layer is formed, and the second mother substrate, on which the diffraction pattern layer is formed; forming, by cutting the bonded substrate structure, a plurality of unit substrate structures each comprising a first substrate on which the pixel layer is formed and a second substrate on which the diffraction pattern layer is formed; forming a protection member on the diffraction pattern layer; and removing a foreign material on the diffraction pattern layer with the protection member.

A display device and a method of manufacturing the display device are provided. The display device includes a display panel having a first substrate and a second substrate bonded to the first substrate and in which a display area displaying an image and a non-display area extending towards the outside of the display area are formed; a sealant arranged between the first substrate and the second substrate and surrounding the display area; wirings arranged on the first substrate; and a black matrix arranged on the second substrate, wherein a heat energy passing portion through which a heat energy applied from the outside towards the sealant passes is formed in the display panel.

Display device and method of manufacturing the same

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Yongin-si, South Korea

Janghyun Kim