Agilent Technologies, Inc.

Jane Ann Leous

William H Wilson

Paul C Dryden

Richard P White

Sammye Elizabeth Traudt

George P Walsh

An apparatus includes a first column heating apparatus, which includes: a first substrate; a second substrate including silicon; and a first heating element disposed between the first substrate and the second substrate. The apparatus also includes a second column heating apparatus, which includes: a third substrate; a fourth substrate including silicon; and a second heating element disposed between the third substrate and the fourth substrate.

Gas chromatography (GC) column heater

A gas chromatography (GC) column heating apparatus is described. The GC column heating apparatus includes a first substrate; a heating element disposed over the first substrate; and a second substrate. A gas chromatography (GC) column heating and cooling apparatus is also described. The GC column cooling and heating apparatus includes a housing configured to receive a heating apparatus, the heating apparatus comprising a first side and a second side; a first thermal insulation layer disposed over the first side; a second thermal insulation layer disposed over the second side; and an actuator connected to the housing and configured to move the first and second thermal insulation layers in contact with the first and second sides, respectively, during a heating sequence, and to move the first and second layers of insulation out of contact with the first and second sides, respectively, during a cooling sequence.

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Philadelphia, PA, United States of America

Jane Ann Leous