Unaxis Deutschland Holding Gmbh

J&uuml;rgen Bruch

Joachim Szczyrbowski

G&ouml;tz Teschner

Anton Zmelty

Dietmar Marquardt

A process gas source ( ) is connected to the vacuum chamber ( ), and a metering valve ( ) actuated by an automatic controller is installed between the vacuum chamber ( ) and the process gas source ( ). A potentiometric measurement electrode compares the amount of a gas in the vacuum chamber ( ) with a reference gas by way of a reference electrode or with a solid body substituting for the reference electrode and sends a signal to automatic control unit ( ), which contains a signal amplifier. The control unit then drives the generator of the power supply or the metering valve for the process gas.

Apparatus for applying thin layers to a substrate

A sputtering electrode is switched between two power values at a constant reactive gas flow rate which is selected so that the target of the sputtering electrode is in the metallic mode at the first power value while in the oxide mode at a second power value.

Growing community of inventors

Hammersbach, Germany

Jürgen Bruch

Growing community of inventors

Hammersbach, Germany

J&uuml;rgen Bruch

Jürgen Bruch