Kla Tencor Corporation

Janay Camp

Michael E Adel

Barak Bringoltz

Tal Marciano

Dana Klein

Tal Itzkovich

Vidya Ramanathan

Ady Levy

Mark Ghinovker

Daniel Kandel

Leonid Poslavsky

Nuriel Amir

John Charles Robinson

Mark Wagner

Tzahi Grunzweig

Nadav Carmel

Method, metrology modules and RCA tool are provided, which use the behavior of resonance region(s) in measurement landscapes to evaluate and characterize process variation with respect to symmetric and asymmetric factors, and provide root cause analysis of the process variation with respect to process steps. Simulations of modeled stacks with different layer thicknesses and process variation factors may be used to enhance the analysis and provide improved target designs, improved algorithms and correctables for metrology measurements. Specific targets that exhibit sensitive resonance regions may be utilize to enhance the evaluation of process variation.

Analyzing root causes of process variation in scatterometry metrology

A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.

Feed forward of metrology data in a metrology system

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Ballston Spa, NY, United States of America

Janay Camp