Asml Netherlands B.v.

Jan Willem Cromwijk

Martinus Hendrikus Antonius Leenders

Hans Jansen

Anthonius Martinus Cornelis Petrus De Jong

Robert Douglas Watso

Antonius Johannus Van Der Net

Teunis Cornelis Van Den Dool

Jacques Cor Johan Van Der Donck

Peter Franciscus Wanten

Nadja Schuh

Johannes Catharinus Hubertus Mulkens

Michel Riepen

Sergei Shulepov

Koen Steffens

Richard Moerman

Nicolaas Rudolf Kemper

Marco Koert Stavenga

Erik Henricus Egidius Catharina Eummelen

Paulus Martinus Maria Liebregts

Ronald Van Der Ham

Marinus Jochemsen

Marco Baragona

David Bessems

Youri Johannes Laurentius Maria Van Dommelen

Jimmy Matheus Wilhelmus Van De Winkel

Pieter Mulder

Fabrizio Evangelista

Gert-Jan Gerardus Johannes Thomas Brands

Jacob Marinus Jan Den Toonder

Pieter Lein Joseph Gunter

Hua Li

Erik Witberg

Ralph Joseph Meijers

Johanna Antoinette Maria Sondag-Huethorst

Robertus Leonardus Maria In 't Groen

Milica Kovacevic-Milivojevic

Ferdinand Bernardus Johannus Wilhelmus Maria Hendriks

Zhenhua Ma

Marcus Agnes Johannes Smits

Franciscus Wilhelmus Bell

Ralph Theodorus Hubertus Maessen

Marjan Leonardus Catharina Hoofman

Thomas Laursen

An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).

Lithographic apparatus and contamination removal or prevention method

A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system. The construction of the reflector is also described as is a method for irradiating the underside of a liquid supply system for use in cleaning.

Lithographic apparatus, reflective member and a method of irradiating the underside of a liquid supply system

An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.

Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

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Best, Netherlands

Jan Willem Cromwijk