Jenoptik Optical Systems Gmbh

Jenoptik Optical Solutions Gmbh

Trioptics Gmbh

Jan Werschnik

Torsten Erbe

Marc D Himel

James J Kumler

Markus Augustin

Gunnar H Gunnarsson

Andrea Koertvelyessy

Stefan Franz

Lutz Reichmann

Joerg Wunderlich

Birgit Massino

Tim Baldsiefen

Achmed Esselbach

Juergen Weise

An apparatus () for focus adjustment for a device () for laser material processing, which has a movably arranged first lens unit (), which comprises a first lens (), and a movably arranged second lens unit (), which comprises a second lens (), has an adjustment device () which is designed to move the first lens unit () in a first direction () and to move the second lens unit () in a second direction () opposite to the first direction () in order to adjust a distance between the first lens () and the second lens () for the focus adjustment.

Apparatus and method for focus adjustment for a material processing device, and device for laser material processing

A method characterizes a scanning light source configured to emit illumination propagating in any one of a plurality of directions spanning an angular range. The method includes (i) detecting, with a camera, illumination propagating at each of the plurality of directions; (ii) storing image data corresponding to a response of the camera to the detected illumination. The method also includes (iii) processing the image data to characterize at least one of the angular range, pointing accuracy, pointing jitter, a divergence of the illumination, a uniformity of the illumination, and a fidelity of a scanning pattern, formed by the scanning light source, to a predetermined pattern.

Light-source characterizer and associated methods

The invention relates to a device () for optical beam expansion of an optical system having a guide tube (), a first guide cylinder () having a first lens (), wherein the first guide cylinder () is arranged within the guide tube () so as to be displaceable along the longitudinal axis of the guide tube (), and a second guide cylinder () having a second lens (), wherein the second guide cylinder () is arranged within the guide tube () so as to be displaceable along the longitudinal axis of the guide tube (). A first displacement device is provided to displace the first guide cylinder () along the longitudinal axis () of the guide tube (), and a second displacement device is provided to displace the second guide cylinder () along the longitudinal axis of the guide tube ().

Device for optical beam expansion, optical system, and method for setting a spacing of two lenses of a device for optical beam expansion

The invention relates to a method for producing a wavefront-corrected optical arrangement comprising at least two optical elements. Using the method, a total wavefront error in the optical arrangement is determined and compared to a permissible tolerance range for the total wavefront error. To perform the method, the optical elements are individualized by assigning an individual identifier to each of them, such that individualized optical elements are obtained, individual surface defects are measured with correct coordinates on all the individualized optical elements and the measured individual surface defects are stored with correct coordinates assigned to the appropriate individualized optical element. The optical arrangement comprising the individualized optical elements is produced virtually as a virtual optical arrangement and a total wavefront error is calculated for the virtual optical arrangement.

Method for producing a wavefront-corrected optical arrangement comprising at least two optical elements

Mount assembly with a monolithic mount formed by a mount ring with a plurality of retaining arms with free ends and an element, which retaining arms are arranged concentrically around the axis of symmetry of the mount ring and extend at least partially in axial direction. Three of the retaining arms contact an end face formed at the element and hold the element axially, while the other retaining arms are bonded to a circumferential surface formed at the element and prevent the element in particular from rotating.

Low-stress mount assembly

The invention relates to an adjustable, deformable mirror for compensating irregularities of a beam with a mirror element for reflecting incident rays of the beam, a base body for securing the mirror element and at least one actuating element for applying forces to the mirror element, wherein the mirror element is a planar element with a thickness of at least 1 mm, and the actuating element is a lever mechanism with lever elements. The invention also relates to a method for compensating irregularities of a beam as well as an optical arrangement with a mirror according to the invention.

Adjustable, deformable mirror for compensating irregularities of a beam

The invention relates to an exposure device () for the structured exposure of a wafer, having at least one exposure arrangement with which a beam that is separated into two sub-beams is modulated via two micromirror arrays in order to increase the throughput speed during the exposure of wafers.

Growing community of inventors

Jena, Germany

Jan Werschnik