Asml Netherlands B.v.

Jan Van Elp

Levinus Pieter Bakker

Vadim Yevgenyevich Banine

Martinus Hendrikus Antonius Leenders

Joost Jeroen Ottens

Hugo Matthieu Visser

Sjoerd Nicolaas Lambertus Donders

Patricius Aloysius Jacobus Tinnemans

Johannes Hubertus Josephina Moors

Johannes Petrus Martinus Bernardus Vermeulen

Frank Jeroen Pieter Schuurmans

Wilhelmus Josephus Box

Edwin Johan Buis

Jan Evert Van Der Werf

Erwin John Van Zwet

Jan Frederik Hoogkamp

Aschwin Lodewijk Hendricus Johannes Van Meer

Raimond Visser

Henricus Gerardus Tegenbosch

Hendrik Antony Johannes Neerhof

Marco Le Kluse

Patrick Johannes Cornelus Hendrik Smulders

Peter Theodorus Maria Giesen

Leo Wilhelmus Maria Kuipers

Franciscus Andreas Cornelis Johannes Spanjers

Johannes Charles Adrianus Van Den Berg

Henricus Johannes Adrianus Van De Sande

Thijs Vervoort

Adrianus Mathijs Maria De Groof

Peter Giesen

Jacob Jan Van Der Velde

A method for joining at least two members of a lithographic apparatus is disclosed. The method includes providing a first member, providing a second member, direct-bonding the first member and the second member to form a direct-bond, and anodically bonding the first member and the second member. At least one of the members includes ultra low expansion glass and/or ultra low expansion glass ceramics.

Method for joining at least a first member and a second member, lithographic apparatus and device manufacturing method, as well as a device manufactured thereby

A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.

Device manufacturing method, lithographic apparatus and device manufactured thereby

The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.

Lithographic support structure

A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of the article. The article handler includes an electrode and a dielectric layer in order to form an electrostatic clamp for electrostatically clamping the article.

Lithographic apparatus and device manufacturing method

In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating spectral filter. The grating spectral filter may be formed of a material effectively invisible to the desired radiation.

Lithographic apparatus, device manufacturing method, and device manufactured thereby

A lithographic projection apparatus with a chuck in which a dielectric element of the electrostatic chuck has a specific resistivity of at least 10&#x3a9;cm so that once the potential difference between electrodes of the chuck is removed the force on the article to be clamped reduces below a predetermined minimum level quickly. The dielectric element also has a coefficient of thermal expansion of less than 0.02&#xd7;10K. A method of manufacturing a chuck includes joining a first glass ceramic element with a second glass element with an electrode therebetween in which a current is passed through the second glass element.

Chuck, lithographic projection apparatus, method of manufacturing a chuck and device manufacturing method

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Delft, Netherlands

Jan Van Elp