Asml Netherlands B.v.

U.S. Philips Corporation

Koninklijke Philips Corporation N.V.

Asm Lithography B.v.

Asm Technology Singapore Pte Ltd

Asm Lithography

Jan Van Eijk

Johannes Petrus Martinus Bernardus Vermeulen

Engelbertus Antonius Fransiscus Van Der Pasch

Sven Antoin Johan Hol

Erik Roelof Loopstra

Robert-Han Munnig Schmidt

Johannes M Van Kimmenade

Hans Butler

Theodorus Petrus Maria Cadee

Yang-Shan Huang

Felix Godfried Peter Peeters

Theo Anjes Maria Ruijl

Gerard Van Schothorst

Gerard Van Engelen

Cornelis D Van Dijk

Hendrikus H Cox

Harmen Klaas Van Der Schoot

Johan Cornelis Compter

Wilhelmus Henricus Theodorus Maria Aangenent

Fransiscus Mathijs Jacobs

Frank B Sperling

Thomas Petrus Hendricus Warmerdam

Angelo Cesar Peter De Klerk

Richard Henricus Adrianus Van Lieshout

Hubert Gerard Jean Joseph Amaury Vroomen

Jeroen Johannes Theodorus Hendrikus De Best

Henricus W Janssen

Fransiscus Hendrikus Van Deuren

Henricus E Beekman

Adrianus Van Der Pal

Hendricus Jm Meijer

Nicolaas Rudolf Kemper

Henrikus Herman Marie Cox

Andre Bernardus Jeunink

Marc Wilhelmus Maria Van Der Wijst

Antonius Franciscus Johannes De Groot

Marinus Aart Van Den Brink

Ruud Antonius Catharina Maria Beerens

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Marcel Koenraad Marie Baggen

Adrianus Gerardus Bouwer

Robbert Edgar Van Leeuwen

Michel Gerardus Pardoel

Johannes Antonius Gerardus Akkermans

Jeroen Dekkers

Christiaan Louis Valentin

Ronald Maarten Schneider

Robertus Mathijs Gerardus Rijs

Petrus Carolus Maria Frissen

Adrianus J Vermeer

Maarten Hartger Kimman

Arjan Franklin Bakker

Sander Christiaan Broers

Michael Johannes Vervoordeldonk

Stan Henricus Van Der Meulen

Gerard Johannes Pieter Nijsse

Marinus Maria Johannes Van De Wal

Silvester Matheus Reijnders

Johan Van Der Maaden

Hendrikus Johannes Schellens

Dennis Erwin Bos

Michael Josepha Mathijs Renkens

Jasper Anne Frido Marikus Simons

Jan A Markvoort

Adrianus Marinus Wouter Heeren

Jeroen De Boeij

Bo Lenssen

Antoine Hendrik Verweij

Franciscus Martinus Roes

Petrus C M Frissen

Simon Bernardus Cornelis Maria Martens

George Alois Leonie Leenknegt

Lucas Franciscus Koorneef

Jacobus Frederik Molenaar

Marijn Kessels

Daniël Godfried Emma Hobbelen

Michael Wilhelmus Theodorus Koot

Gerbrand Petrus Johannes Van Den Hoven

Gerardus Johannes Verdoes

Ronatus Gerardus Klaver

Timotheus Hubertus Christiaan Groothuijsen

Angelo Oscar Peter De Klerk

Marcel C Baggen

Petrus R Bartray

Johannes A Rozenveld

Adianus G Bouwer

Peter Van Der Krieken

Martinus A Van Den Brink

Hubert A Neilen

Johannes M M Van Kimmenade

Stanley Constant Johannes Martinus Van Den Berg

Pieter Hubertus Godefrida Wullms

Geert-Jan Petrus Naaijkens

Wei Zhou

A positioning table, for example for a wire bonder has first and second arms, each of said first and second arms being independently drivable linearly along a first axis, and a stage that is engaged with both the first and second arms. The stage engages with each of the first and second arms via a respective engagement mechanism such that the stage is movable both linearly along the first axis, and rotatable about a rotary axis coincident with a center-point of the stage, the rotary axis being orthogonal to the first axis. Each engagement mechanism is configured to permit a respective distance between the center-point of the stage and an end of each of the first and second arms to vary during movement of an arm along the first axis.

Y-theta table for semiconductor equipment

A control system for a positioning system, for positioning a driven object, e.g. in a lithographic apparatus, in N dimensions has M sensors, where M&#x3e;N. A transformation module converts the M measurements by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.

Control system, positioning system, lithographic apparatus, control method, device manufacturing method and control program

A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.

Sensor, object positioning system, lithographic apparatus and device manufacturing method

A stage positioning system, includes a first body, a second body and a coupling arranged to couple the first body and the second body to each other. The coupling includes a visco-elastic element arranged to couple the first body and the second body to each other. The stage positioning system may further include a sensor to provide a signal representative of a position of the first body. The stage positioning system may further include an actuator to move the first body. The second body may be arranged to couple the actuator and the coupling to each other.

Stage positioning system and lithographic apparatus

A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.

Lithographic apparatus, method of deforming a substrate table and device manufacturing method

The invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an encoder-type measurement system configured to at least during projection of the patterned radiation beam onto a target portion of the substrate continuously determine a position quantity of a patterning device supported on the patterning device support using a grid or grating provided on the patterning device.

Lithographic apparatus, and patterning device for use in a lithographic process

The invention relates to a suction unit and relates to a vacuum cleaner. The suction unit comprises a drive system for driving the suction unit over a surface to be treated; a chassis supporting the drive system; a nozzle for removing particles from a surface to be treated which nozzle is configured to move with relation to the chassis in a direction away from the surface to be treated, the nozzle having an interior space defining an opening that faces the surface to be treated; and an outlet communicating with the interior space, the outlet being arranged for communication with a fan unit in operating conditions. The suction unit further comprises coupling means for coupling the nozzle to the chassis, wherein the coupling means is arranged to exert a force that is directed away from the surface to be treated when the under pressure in the interior space increases. In this manner the problem of the suction unit getting stuck on the floor can be overcome or at least be reduced. Furthermore the traction of the drive system can be improved. An autonomous vacuum cleaner according to the invention comprises such a suction unit and further comprises a dust chamber, and a fan unit that communicates with the dust chamber, the fan unit communicating with the outlet for creating under pressure in the interior space of the nozzle in operating conditions.

Suction unit and autonomous vacuum cleaner

A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.

Lithographic apparatus comprising a substrate table and a surface substrate actuator

A system for detecting motion of a body, the system comprising: a body; a first grating mounted substantially stationary relative to a frame of reference; a second grating mounted on the body; a detector arranged to receive one or more radiation beams diffracted at the first and second gratings thereby to detect motion of the body relative to the frame of reference; wherein the detector is coupled to the body and moveable relative to the body.

System for detecting motion, lithographic apparatus and device manufacturing method

A method for positioning a substage, supported by a main stage, relative to a reference object, the substage moveable in a direction between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems, each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.

Positioning system and a method for positioning a substage with respect to a frame

An electromagnetic actuator includes a first and second magnetic members that are displaceable relative to each other and are arranged to provide a magnetic circuit; and a coil configured to, in use, receive a current to generate a magnetic flux through the magnetic circuit, thereby generating a force between the first and second magnetic members in a first direction, the magnetic flux, in use, being transferred between the first and second magnetic members through a first surface of the first magnetic member and a second surface of the second magnetic member, the first and second surface being separated by an airgap, wherein the first surface and the second surface are arranged relative to each other such that an outer dimension of the first surface extends beyond an outer dimension of the second surface in a second direction substantially perpendicular to the first direction.

Electromagnetic actuator, stage apparatus and lithographic apparatus

A positioning system to position a movable object having a body, the positioning system includes an object position measurement system, an object actuator, and an object controller, wherein the positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object, the stiffener including; one or more sensors, wherein each sensor is arranged to determine a measurement signal representative of an internal strain or relative displacement in the body, one or more actuators, wherein each actuator is arranged to exert an actuation force on a part of the body, and at least one controller, configured to provide on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body.

Positioning system, lithographic apparatus and method

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The substrate table and/or the support may be provided with an accelerometer to measure an acceleration of the substrate table and/or the support and the apparatus is provided with a calculator in communication with the accelerometer to calculate an acceleration based position signal from the acceleration measured by the accelerometer.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless

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Eindhoven, Netherlands

Jan Van Eijk