Tdk Corporation

Epcos Ag

Tdk Electronics Ag

Huntsman Advanced Materials Americas LLC

Dtcon A/s

3D Systems, Inc.

Jan Tue Ravnkilde

Kurt Rasmussen

Pirmin Hermann Otto Rombach

Dennis Mortensen

Morten Ginnerup

Leif Steen Johansen

Jotaro Akiyama

Anton Leidl

Gino Rocca

Henning Henningsen

Cheng-Yen Liu

Wolfgang Pahl

Jürgen Portmann

Marcel Giesen

Matthias Jungkunz

Armin Schober

Christian Siegel

Ivan Riis Nielsen

Pirmin Rombach

A microelectromechanical (MEMS) microphone with membrane trench reinforcements and method of fabrication is provided. The MEMS microphone includes a flexible plate and a rigid plate mechanically coupled to the flexible plate. The MEMS microphone includes a stoppage member affixed to the rigid plate and extending perpendicular relative to a surface of the rigid plate opposite the surface of the flexible plate. The stoppage member limits motion of the flexible plate. The rigid plate includes a reverse bending edge that includes a first lateral etch stop that includes a first corner radius and a second corner radius. The first corner radius is more than 100 nanometers and the second corner radius is more than 25 nanometers. Further, a lateral step width between the first corner radius and the second corner radius is less than around 4 micrometers.

Microelectromechanical microphone with membrane trench reinforcements and method of fabrication

In an embodiment, a method for fabricating a Microelectromechanical System (MEMS) microphone includes depositing, on a frontside of a wafer, a first oxide layer over a silicon nitride thin film and over and adjacent the wafer, wherein the silicon nitride thin film is disposed over the wafer, depositing a membrane protection layer over the first oxide layer between a first side of a first cavity formed in the wafer and a second side of a second cavity formed in the wafer, depositing a second oxide layer over and adjacent the membrane protection layer, depositing a first membrane nitride layer over the second oxide layer, depositing a membrane polysilicon layer over the first membrane nitride layer, depositing a second membrane nitride layer over the membrane polysilicon layer, depositing a third oxide layer over the second membrane nitride layer and depositing a fourth oxide layer over the third oxide layer.

A microelectromechanical (MEMS) microphone with membrane trench reinforcements and method of fabrication is provided. The MEMS microphone includes a flexible plate and a rigid plate mechanically coupled to the flexible plate. The MEMS microphone includes a stoppage member affixed to the rigid plate and extending perpendicular relative to a surface of the rigid plate opposite the surface of the flexible plate. The stoppage member limits motion of the flexible plate. The rigid plate includes a reverse bending edge that include a first lateral etch stop that includes a first corner radius and a second lateral etch stop that includes a second corner radius. The first corner radius is more than 100 nanometers and the second corner radius is more than 25 nanometers. Further, a lateral step width between the first corner radius and the second corner radius is less than around 4 micrometers.

In an embodiment a MEMS microphone includes a substrate, a shield layer, a central insulation layer and a membrane, wherein the substrate has an upper surface with a first opening therein, wherein the shield layer is arranged between the upper surface of the substrate and the membrane, the shield layer having a second opening, wherein the central insulation layer is arranged between the shield layer and the membrane, the shield layer comprising a dielectric bulk material having a third opening and an etch stopper forming an edge of the central insulation layer towards the third opening such that the dielectric bulk material of the central insulation layer is completely enclosed between the shield layer, the etch stopper and the membrane, and wherein all openings are arranged one above another to form a common sound channel to the membrane.

MEMS microphone and method of manufacture

A MEMS microphone including a carrier board and a MEMS chip mounted thereon over a sound opening. A filter chip includes a bulk material with an aperture covered and closed by a mesh. The mesh includes a layer of the filter chip with parallel through-going first holes structured in the layer. The filter chip is arranged in or on the carrier board such that the mesh covers the sound opening.

MEMS microphone with improved particle filter

A non-uniform stress distribution of a MEMS microphone having a non-circular shape is compensated by a structured back plate that has a compensating structure to provide a stress distribution opposite to that of the membrane.

Condenser microphone with non-circular membrane

A package for a top port microphone with an enlarged back volume. The package includes on a substrate a lid enclosing thereunder a total volume and accommodating a MEMS chip and an ASIC. A stopper seals the ASIC against the lid thereby separating and dividing the total volume under the lid in a volume extension and a remaining volume. The volume extension can be used to arbitrarily enlarge the back volume or the front volume dependent on a placement of a sound port to the volume extension or the remaining volume. A sound path connects the volume extension and a partial volume enclosed between MEMS chip and substrate.

Top port microphone with enlarged back volume

A microphone and a method for operating a Microphone are disclosed. In an embodiment the microphone includes a transducer and a mode controller. The microphone has a normal operating mode (M) and a collapse mode (M). The mode controller switches to the collapse mode (M) when an output signal of the transducer reaches or exceeds a predefined threshold value and switches to the normal operating mode (M) when the output signal reaches or falls below a predefined further threshold value (S).

Microphone and method of operating a microphone

A top-port MEMS-microphone has an upper side and a bottom side. The microphone includes a MEMS chip with a monolithically connected protection element at the upper side, a backplate, and a membrane. The microphone also includes a sound inlet at the upper side and a mechanical or electrical connection at the bottom side.

Top-port MEMS microphone and method of manufacturing the same

A MEMS microphone with reduced parasitic capacitance is provided. A microphone includes a protection film covering a rim-sided area of the backplate.

MEMS-microphone with reduced parasitic capacitance

A microphone assembly is disclosed. In an embodiment, the assembly includes a transducer and an electronic circuit operatively connected to the transducer, wherein the electronic circuit comprises a test mode circuitry configured to selectively set the microphone assembly in one or more test modes or an operational mode, and wherein the one or more test modes enable determining at least one parameter of the transducer.

Microphone assembly and method for determining parameters of a transducer in a microphone assembly

A MEMS microphone has reduced parasitic capacitance. The microphone includes a trench electrically separating an acoustically active section of a backplate from an acoustically inactive section of the backplate.

MEMS microphone with reduced parasitic capacitance

The present invention concerns a MEMS device comprising an under bump metallization ()&#x2014;UBM&#x2014;to contact the device via flip-chip bonding with a substrate. The UBM () is placed on the surface of the MEMS device and close to the corners of the surface. Further, the shape of the UBM () is adapted to the shape of the corners.

MEMS device comprising an under bump metallization

The present invention concerns a MEMS microphone assembly () comprising a MEMS transducer element () comprising a MEMS die (), a back plate () and a diaphragm () displaceable in relation to the back plate (), and a sound inlet () for acoustically coupling the MEMS transducer element () to the exterior of the MEMS microphone assembly (), wherein the MEMS die () comprises an indentation () that forms at least a part of the sound inlet (). Further, the present invention concerns a method of manufacturing said MEMS microphone assembly ().

MEMS microphone assembly and method of manufacturing the MEMS microphone assembly

A MEMS backplate enables MEMS microphones with reduced parasitic capacitance. The MEMS backplate includes a central area and a perforation in the central area. A suspension area surrounds the central area at least partially. An aperture is disposed in the suspension area.

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Hedehusene, Denmark

Jan Tue Ravnkilde