Asml Netherlands B.v.

Jan Jaap Krikke

Markus Franciscus Antonius Eurlings

Markus F Eurlings

Vadim Yevgenyevich Banine

Heine Melle Mulder

Paul Van Der Veen

Hako Botma

Martinus Van Duijnhoven

Johannes Hendrik Everhardus Aldegonda Muijderman

Jan Hoegee

Cornelis Petrus Andreas Marie Luijkx

Cornelis Jacobus Van Duijn

Johannes Hendrick Everardus Aldegonda Muiderman

An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.

Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing method

An illuminator for controlling a beam of radiation for a lithographic projection apparatus includes a plurality of optical elements and an exchanger for inserting and removing the optical elements from the beam path. The intensity distribution of the beam at a pupil plane of the illuminator is determined by the optical elements. Different illumination settings (intensity distributions) can be obtained by the exchanger swapping between different optical elements, without the need for a zoom-axicon module.

Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus

A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus such that the change in intensity anomaly introduced by it counteracts an elliptically symmetric intensity anomaly present in the projection beam or introduced by another optical element traversed by the projection beam.

Lithographic apparatus, device manufacturing method, and device manufactured thereby

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Jan Jaap Krikke