Carl Zeiss Smt Gmbh

Carl Zeiss Ag

Carl Zeiss Multisem Gmbh

Carl Zeiss Industrielle Messtechnik Gmbh

Jan Horn

Markus Deguenther

Johannes Eisenmenger

Johannes Wangler

Damian Fiolka

Michael Patra

Manfred Maul

Yim-Bun Patrick Kwan

Stefan Xalter

Michael Layh

Florian Bach

Andras G Major

Markus Holz

Ulrich Bihr

Stefan Krone

Christian Kempter

Christof Riedesel

Erik Essers

Lars Berger

Benedikt Knauf

Yanko Sarov

Markus Hauf

Nils Haverkamp

Sascha Bleidistel

Peter Westphal

Stefan Richter

Kerstin Hild

Severin Waldis

Lars Omlor

Frank Höller

Yim-Bun-Patrick Kwan

Tanja Teuber

Matthias Orth

Joerg Specht

Thomas Wollweber

Mohammad Awad

Florian Bart

Fabian Haacker

Markus Degünther

Benjamin Sigel

Andy Zott

Stefan Tuerk

Oscar Noordman

Wolfgang Fallot-Burghardt

Marc Schneider

Klaus Syrowatka

András G Major

Stefan TÜRK

Matthias Hartmann

A method for operating a LIDAR system with at least one spectrally tunable light source emitting a light beam having a temporally varying frequency and a transparent protective shield, arranged in a light path of the light beam, protecting the LIDAR system against environmental pollution includes determining distance values of an object based on beat frequencies of beat signals resulting from a superposition of partial signals obtained from partial reflection of the light beam at the object with reference signals not reflected at the object. Each distance value is determined from a peak in a signal spectrum obtained on the basis of a Fourier transformation of the beat signal. A degree of soiling of the protective shield is diagnosed by analyzing the signal spectrum in a predefined analysis frequency range. An upper limit frequency bounding said analysis frequency range is based on a distance of the protective shield.

Method for operating a LIDAR system

A mirror including a substrate (), a reflection layer system (), and at least one continuous piezoelectric layer (, . . . ) arranged between the substrate and the layer system. An electric field producing a locally variable deformation is applied to the piezoelectric layer via a first, layer-system-side electrode arrangement and a second, substrate-side electrode arrangement. At least one of the electrode arrangements is assigned a mediator layer () setting an at least regionally continuous profile of the electrical potential along the respective electrode arrangement. The electrode arrangement to which the mediator layer is assigned has a plurality of electrodes (, . . . ), each of which is configured to receive an electrical voltage relative to the respective other electrode arrangement. In the region that couples two respectively adjacent electrodes, the mediator layer is subdivided into a plurality of regions (, . . . ) that are electrically insulated from one another.

Mirror, in particular for microlithography

An apparatus for ascertaining a distance to an object has a light source unit for emitting an optical signal with a time-varying frequency, an evaluation device for ascertaining a distance to the object based on (a) a measurement signal that arose from the signal and was reflected at the object and (b) a reference signal that was not reflected at the object. The apparatus has also a dispersive element disposed in the signal path of the optical signal and an optical position sensor disposed downstream of this dispersive element in the signal path.

Apparatus and method for ascertaining a distance to an object

A system for determining the position of a movable object in space includes a marker which is to be applied to the object. The marker has a surface which is subdivided into a plurality of individual fields. The fields each have a statistical noise pattern. The system also includes an image capture unit which is remote from the object and is arranged to capture an image of the marker. The system further includes an image evaluation unit which stores a reference image of the noise patterns and is designed to locate at least one of the fields in the currently captured image of the marker by comparison with the reference image in order to determine a current position of the marker in space. There are corresponding methods for determining a position the object.

System, method and marker for the determination of the position of a movable object in space

An optical arrangement for a lithography apparatus has a microsystem with a mirror array. A respective mirror of the mirror array is set up to reflect working light of the lithography apparatus on its front side and also a measuring beam on its rear side. One or more radiation sources, which are provided outside the microsystem, are set up to provide the respective measuring beam. One or more sensor units are set up to sense a tilting angle of a respective mirror in dependence on the respectively reflected measuring beam.

Optical arrangement and lithography apparatus

An image sensor for a position sensor apparatus for ascertaining a position of at least one mirror of a lithography apparatus includes: a plurality of integrated optical waveguides; a plurality of incoupling areas; a multiplexer apparatus; and an image reconstruction apparatus.

Image sensor, position sensor device, lithography system, and method for operating an image sensor

A multi-beam particle beam system includes a multi-aperture plate having a multiplicity of apertures. During operation, one particle beam of the plurality of particle beams passes through each of the apertures. A multiplicity of electrodes are insulated from the second multi-aperture plate to influence the particle beam passing through the aperture. A voltage supply system for the electrodes includes: a signal a generator to generate a serial sequence of digital signals; a D/A converter to convert the digital signals into a sequence of voltages between an output of the D/A converter and the multi-aperture plate; and a controllable changeover system, which feeds the sequence of voltages successively to different electrodes.

Multi-beam particle beam system

A control device for an assembly having a plurality of sensors and/or actuators includes at least one first control unit which is designed to be vacuum-suitable, has a distributor for splitting and/or combining signals and has a converter for converting digital signals into analog signals and/or analog signals into digital signals.

Control device

The disclosure provides a sensor arrangement for sensing a position of an optical element in a lithography system. The sensor arrangement includes: a first capacitive sensor device having a position-dependent variable first sensor capacitance that can be sensed using a first excitation signal; a second capacitive sensor device having a position-dependent variable second sensor capacitance that can be sensed using a second excitation signal; and a control device configured to produce the first and second excitation signals so that charges present on a parasitic capacitance associable with the first sensor device are at least partially compensated for by charges that are present on a parasitic capacitance associable with the second sensor device via a signal path outside the first and/or the second excitation signal path.

Sensor arrangement for a lithography system, lithography system, and method for operating a lithography system

The disclosure relates to a device for transmitting electrical signals between a first interface element, arranged at a first structure of a lithography system, and a second interface element, arranged at a second structure of the lithography system. An electrical conductor connects the first interface element and the second interface element. The device has a hollow body which surrounds at least sections of the electrical conductor and which is designed to electromagnetically shield the electrical conductor. A gap is provided in the hollow body or between the hollow body and one of the structures and allows a relative movement of the first structure and the second structure to mechanically decouple the first structure from the second structure.

Device for transmitting electrical signals, and lithography apparatus

A sensor arrangement includes at least one position sensor apparatus for providing a position signal for a mirror and an evaluation apparatus for ascertaining the position of the mirror depending on the position signal.

Sensor assembly and method for determining respective positions of a number of mirrors of a lithography system

Sensor arrangements, methods for ascertaining a respective position of a number of mirrors of a lithography apparatus, projection systems of a lithography apparatus, and lithography apparatus are disclosed. The sensor arrangement includes at least one position sensor apparatus for providing a position signal for a mirror and an evaluation apparatus for ascertaining the position of the mirror depending on the position signal.

A multi-mirror array including displaceable mirror elements includes a passive electric damping mechanism for damping disturbances of the displacement positions of the mirror elements.

Multi-mirror array

A micromirror of a micromirror array in an illumination system of a microlithographic projection exposure apparatus can be tilted through a respective tilt angle about two tilt axes. The micromirror is assigned three actuators which can respectively be driven by control signals in order to tilt the micromirror about the two tilt axes. Two control variables are specified, each of which is assigned to one tilt axis and which are both assigned to unperturbed tilt angles. For any desired combinations of the two control variables, as a function of the two control variables, one of the three actuators is selected and its control signal is set to a constant value, in particular zero. The control signals are determined so that, when the control signals are applied to the other two actuators, the micromirror adopts the unperturbed tilt angles as a function of the two control variables.

Methods and devices for driving micromirrors

Growing community of inventors

Munich, Germany

Jan Horn