Asml Netherlands B.v.

Jan Groenewold

Sjoerd Nicolaas Lambertus Donders

Richard Joseph Bruls

Andrey Alexandrovich Nikipelov

Adrianus Hendrik Koevoets

Dzmitry Labetski

Maxim Aleksandrovich Nasalevich

Hendrikus Gijsbertus Schimmel

Johannes Adrianus Cornelis Maria Pijnenburg

Jacobus Cornelis Gerardus Van Der Sanden

Alain Louis Claude Leroux

Cristian Bogdan Craus

Kerim Nadir

Sander Baltussen

Christian Felix Wählisch

Chuangxin Zhao

Pär Mårten Lukas Broman

Cornelis Adrianus De Meijere

Willem Michiel De Rapper

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.

Cooling apparatus and plasma-cleaning station for cooling apparatus

A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.

Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method

Growing community of inventors

Castricum, Netherlands

Jan Groenewold