Asml Netherlands B.v.

Asml Holding N.v.

Asml Holdings N.v.

Jan-Gerard Cornelis Van Der Toorn

Christiaan Alexander Hoogendam

Sjoerd Nicolaas Lambertus Donders

Jeroen Johannes Sophia Maria Mertens

Henrikus Herman Marie Cox

Roelof Frederik De Graaf

Frits Van Der Meulen

Bob Streefkerk

Martinus Hendrikus Antonius Leenders

Nicolaas Ten Kate

Hans Jansen

Nicolaas Rudolf Kemper

Franciscus Johannes Herman Maria Teunissen

Herman Vogel

Johannes Petrus Maria Smeulers

Stefan Philip Christiaan Belfroid

Michel Riepen

Martinus Cornelis Maria Verhagen

Martijn Houkes

Erik Roelof Loopstra

Johannes Catharinus Hubertus Mulkens

Johannes Jacobus Matheus Baselmans

Joeri Lof

Alexander Straaijer

Klaus Simon

Antonius Theodorus Anna Maria Derksen

Bernardus Antonius Slaghekke

Joost Jeroen Ottens

Gerardus Petrus Matthijs Van Nunen

Edwin Augustinus Matheus Van Gompel

Marco Polizzi

Paulus Martinus Maria Liebregts

Hans Butler

Franciscus Johannes Joseph Janssen

Hernes Jacobs

Peter Smits

Sebastiaan Maria Johannes Cornelissen

Patricius Aloysius Jacobus Tinnemans

Yixiang Wang

Allard Eelco Kooiker

Ying Luo

Shibing Liu

Han Willem Hendrik Severt

Ronald Van Der Wilk

Minne Cuperus

Mark Johannes Hermanus Frencken

Evert Hendrik Jan Draaijer

Antonius Henricus Arends

Jurgen Van Soest

Paulus Martinus Hubertus Vissers

Jeroen Gertruda Antonius Huinck

Jeroen Johannes Sophia M Mertens

Gerardus Petrus Mattijs Van Nunen

Arno Maria Wellink

Chia-Yao Chen

Bohang Zhu

Levinus Pieter Bakker

Zhong-wei Chen

Wilhelmus Franciscus Johannes Simons

Juying Dou

Marcel Koenraad Marie Baggen

Jeroen Pieter Starreveld

Edwin Cornelis Kadijk

Marcel François Heertjes

Mark Constant Johannes Baggen

Frank Auer

Stefan Geerte Kruijswijk

Martinus Van Duijnhoven

Joost De Pee

Petrus Marinus Christianus Maria Van Den Biggelaar

Dennis Herman Caspar Van Banning

Michael Johannes Vervoordeldonk

Franciscus Andreas Cornelis Johannes Spanjers

Qiang Li

Pieter Johannes Gertrudis Meijers

Roelof Frederick De Graaf

Patriek Adrianus Alphonsus Maria Bruurs

Michaël Johannes Christiaan Ronde

Michael Johannes Christiaan Ronde

Arend-Jan Migchelbrink

Shanhui Cao

Kangsheng Qiu

Yinglong Li

Martinus Hendrukus Antonius Leenders

Martinus Cornelius Maria Verhagen

Sjoerd Donders

Jeroen Mertens

Henrikus Cox

Stefan Belfroid

Franciscus Teunissen

Martinus Verhagen

Johannes Smeulers

A charged particle inspection system may include a shielding plate having an aperture or more than one aperture, for example, to permit additional inspection by an additional instrument requiring a line of sight to the area of interest. A field shaping element, such as a window element or a raised rim, is placed at the aperture to prevent or reduce a component of an electric field.

Apparatus for obtaining optical measurements in a charged particle apparatus

Systems and methods for wafer grounding and wafer grounding location adjustment are disclosed. A first method may include receiving a first value of an electric characteristic associated with the wafer being grounded by an electric signal; determining a first control parameter using at least the first value; and controlling a characteristic of the electric signal using the first control parameter and the first value. A second method for adjusting a grounding location for a wafer may include terminating an electric connection between the wafer and at least one grounding pin in contact the wafer; adjusting a relative position between the wafer and the grounding pin; and restoring the electric connection between the grounding pin and the wafer. A third method may include causing a grounding pin to penetrate through a coating on the wafer by impact; and establishing an electrical connection between the grounding pin and the wafer.

Method, apparatus, and system for wafer grounding

A stage apparatus including: an object table configured to hold an object; a positioning device configured to position the object table and the object held by the object table; and a remote temperature sensor configured to measure a temperature of the object table and/or the object, wherein the remote temperature sensor comprises a passive temperature sensing element.

Substrate positioning device with remote temperature sensor

Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

Object table comprising an electrostatic clamp

The present disclosure relates to a stage apparatus comprising: an object table configured to hold a substrate, the object table comprising an electrode configured to be charged by a power source and an electrical connection configured to electrically connect the electrode to the power source, and an electric field shield configured to shield at least a part of the electrical connection.

Stage apparatus

A stage apparatus for a particle-beam apparatus is disclosed. A particle beam apparatus may comprise a conductive object and an object table, the object table being configured to support an object. The object table comprises a table body and a conductive coating, the conductive coating being provided on at least a portion of a surface of the table body. The conductive object is disposed proximate to the conductive coating and the table body is provided with a feature proximate to an edge portion of the conductive coating. Said feature is arranged so as to reduce an electric field strength in the vicinity of the edge portion of the conductive coating when a voltage is applied to both the conductive object and the conductive coating.

Stage apparatus suitable for a particle beam apparatus

Systems and methods of observing a sample in a multi-beam apparatus are disclosed. A multi-beam apparatus may comprise an array of deflectors configured to steer individual beamlets of multiple beamlets, each deflector of the array of deflectors having a corresponding driver configured to receive a signal for steering a corresponding individual beamlet. The apparatus may further include a controller having circuitry to acquire profile data of a sample and to control each deflector by providing the signal to the corresponding driver based on the acquired profile data, and a steering circuitry comprising the corresponding driver configured to generate a driving signal, a corresponding compensator configured to receive the driving signal and a set of driving signals from other adjacent drivers associated with adjacent deflectors and to generate a compensation signal to compensate a corresponding deflector based on the driving signal and the set of driving signals.

Scanning efficiency by individual beam steering of multi-beam apparatus

A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

Growing community of inventors

Eindhoven, Netherlands

Jan-Gerard Cornelis Van Der Toorn