Koninklijke Philips Corporation N.v.

Jan Frank Stromer

Rifat Ata Mustafa Hikmet

Ties Van Bommel

Thomas Caspar Kraan

Nathalie Magali Danielle Dessaud

A beam shaping device () comprising first () and second () substrates, a liquid crystal layer () sandwiched between the substrates, and a first electrode layer () provided on a side of the first substrate () facing the liquid crystal layer (). The beam shaping device is controllable between beam shaping states, each permitting passage of light through the beam shaping device, and further comprises an insulating layer () covering the first electrode layer () and a second electrode layer () provided on top of the insulating layer. The second electrode layer () comprises a conductor pattern exposing a portion of the insulating layer (). The beam shaping device is configured in such a way that application of a voltage (V) between the first () and second () electrode layers causes liquid crystal molecules comprised in a portion of the liquid crystal layer () corresponding to the exposed portion of the insulating layer to tilt in a plane perpendicular to the liquid crystal layer, resulting in a local refractive index gradient, thereby enabling shaping of a beam () of light passing through the beam shaping device.

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Eindhoven, Netherlands

Jan Frank Stromer