Asml Netherlands B.v.

Asml Metherlands B.v.

Jan Cornelis Van Der Hoeven

Marco Koert Stavenga

Johannes Catharinus Hubertus Mulkens

Bob Streefkerk

Hans Jansen

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Johannes Jacobus Matheus Baselmans

Cedric Desire Grouwstra

Jeroen Johannes Sophia Maria Mertens

Martinus Hendrikus Antonius Leenders

Johannes Henricus Wilhelmus Jacobs

David Lucien Anstotz

Erik Roelof Loopstra

Nicolaas Ten Kate

Joost Jeroen Ottens

Nicolaas Rudolf Kemper

Koen Jacobus Johannes Maria Zaal

Frits Van Der Meulen

Richard Joseph Bruls

Hernes Jacobs

Paulus Martinus Maria Liebregts

Marinus Aart Van Den Brink

Leon Martin Levasier

Frederik Eduard De Jong

Noud Jan Gilissen

Marcus Martinus Petrus Adrianus Vermeulen

Youri Johannes Laurentius Maria Van Dommelen

Marcel Hendrikus Maria Beems

Edwin Cornelis Kadijk

Peter Paul Steijaert

Johannes Wilhelmus De Klerk

Peter Franciscus Wanten

Gert-Jan Gerardus Johannes Thomas Brands

Rudy Jan Maria Pellens

Marcus Johannes Van Der Zanden

Coen Cornelis Wilhelmus Verspaget

Vijay Kumar Badam

Jeroen Johannes Sophia Mertens

Casper Roderik De Groot

Thijs Egidius Johannes Knaapen

Rudolf Adrianus Joannes Maas

Marteijn De Jong

Martijn Hendrik Kamphuis

Richard Bernardus Johannes Droste

Harmen Klaus Van Der Schoot

A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

Lithographic apparatus and device manufacturing method

A method for preventing or reducing contamination of an immersion type projection apparatus is provided. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate. The method includes rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.

Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus

A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.

A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. A cleaning device may be provided in the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.

Growing community of inventors

Veldhoven, Netherlands

Jan Cornelis Van Der Hoeven