Asml Netherlands B.v.

Jan Bruining

Johannes Jacobus Matheus Baselmans

Marcel Mathijs Theodore Marie Dierichs

Markus Franciscus Antonius Eurlings

Antonius Johannes Josephus Van Dijsseldonk

Hako Botma

Judocus Marie Dominicus Stoeldraijer

The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (), such that a projection beam of radiation () can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam () will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element () may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.

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Eindhoven, Netherlands

Jan Bruining