Optical Coating Laboratory, Inc.

James W Seeser

Richard Ian Seddon

Michael A Scobey

Paul M LeFebvre

Curtis Ross Hruska

Jaroslaw Zieba

Bryant P Hichwa

Barry W Manley

Michael J Cumbo

William T Beauchamp

Robert T Scanlon

Eric R Dickey

Michael D Temple

David L Soberanis

Thomas H Allen

Robert F Klinger

Rolf F Illsley

Craig C Van Horn

Patrick R Wentworth

Robert W Adair

Basil L Swaby

Christopher Iaconis

Stephen C Olson

Douglas G Jensen

R Russel Austin

Glenn A Clarke

The absorption of a spacer material in a Fabry-Perot type structure is changed to achieve an optical switching function. In one embodiment, the spacer material is a semiconductor material and an electronic control signal changes the Fabry-Perot between a transmissive state and a reflective state. In the reflective state, the device operates as a switch can be modeled as a mirror on a substrate of quasi-infinite thickness. In a further embodiment, a wavelength-selective optical component is placed between the input of the switch and the Fabry-Perot structure to improve the spectral response of the switch.

Fabry-Perot optical switch

The present invention is directed to methods and apparatus for enhancing the performance of visual display units which utilize plasma display panels. More specifically, the present invention provides methods and apparatus for providing an electrical noise suppressing/chromaticity enhancing accessory device for positioning in front of the viewing surface of a plasma display panel. In its most basic embodiment, the accessory device of the present invention comprises a first and a second rigid substrate laminated together by a laminating layer; an optically selective coating providing high photopic transmittance, continuous high electrical conductivity for RFI shielding, and reflectivity specifically within the near-IR region that is mechanically protected by being sandwiched between one rigid substrate and the laminating layer; and, a multiple-dye coating for selectively absorbing IR energy emissions and selectively balancing the chromaticity of the PDP display. The combination of the IR absorption and color-correction due to the multiple-dye coating and the near-IR reflectivity due to the optically selective coating surprisingly results in very good suppression of IR emissions from the PDP within the spectral range of about 800 to about 2500 nm and chromaticity enhancement while simultaneously maintaining good photopic transmittance.

Methods and apparatus for providing a near-IR emission suppressing/color

The present invention is directed to apparatus for enhancing the performance of visual display units which utilize plasma display panels. More specifically, the present invention provides apparatus for providing an electrical noise suppressing/chromaticity enhancing accessory device for positioning in front of the viewing surface of a plasma display panel (PDP). In its most basic embodiment, the accessory device of the present invention comprises an optically selective coating providing high photopic transmittance, continuous high electrical conductivity for RFI shielding, and reflectivity specifically within the near-IR region. It also preferably includes a multiple-dye coating for selectively absorbing IR energy emissions and selectively balancing the chromaticity of the PDP display and a plastic substrate layer to provide impact resistance. The combination of the IR absorption and color-correction due to the multiple-dye coating and the near-IR reflectivity due to the optically selective coating surprisingly results in very good suppression of IR emissions from the PDP within the spectral range of about 800 to about 2500 nm and chromaticity enhancement while simultaneously maintaining good photopic transmittance.

Apparatus for providing a near-IR emission suppressing/color enhancing

A thin film coating system incorporates separate, separately-controlled deposition and reaction zones for depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.

Geometries and configurations for magnetron sputtering apparatus

The present invention is directed to methods and apparatus for enhancing the performance of visual display units which utilize plasma display panels. More specifically, the present invention provides methods and apparatus for providing an optically enhancing/noise suppressing device for positioning in front of the viewing surface of a plasma display panel. The device also increases the impact resistance of the PDP. The device of the present invention is manufactured separately from the PDP. The device may be provided with attachment means for securing the device to the surface of the visual display unit in a position in front of the viewing surface of the PDP or may be designed to be free-hanging, i.e., suspended, or otherwise positioned in front of the viewing surface of the PDP. In its most basic embodiment, the device of the present invention comprises multiple layers of different materials including at least one plastic substrate layer for impact resistance, an optically selective coating providing high photopic transmittance, continuous high electrical conductivity for RFI shielding, and reflectivity specifically within the near-IR region, and an IR absorbing coating for absorbing IR energy emissions. In a preferred embodiment, the IR absorbing coating constitutes a dye material which is preferably selected to also be color-correcting with respect to the particular PDP.

Plasma display panel with infrared absorbing coating

A rotary cylindrical sputtering system incorporates separate, separately-controlled linear magnetron sputter deposition and reaction zones for sputter depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. In one aspect, the associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by the ability to form durable optical quality thin films of nominal refractive indices and controlled coating thickness, including both constant and selectively varied thickness profiles.

Process for depositing optical thin films on both planar and non-planar

Process for depositing optical films on both planar and non-planar

A rotary cylindrical sputtering system incorporates separate, separately-controlled linear magnetron sputter cathode and reaction zones for sputter depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated cathode and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.

Magnetron sputtering apparatus and process

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Santa Rosa, CA, United States of America

James W Seeser