Nordson Corporation

James W Schmitkons

Carl A Bretmersky

James M Borsuk

Jeffrey S Noss

Jan L Shanaberger

Laurence B Saidman

Richard P Price

Richard G Klein

Patrick Gerard Keogh

Jay Wolf

Robert Brassell

Scott Richard Miller

Thomas Burmester

Jurgen Benecke

Arthur Cieplik

Bentley J Boger

Edward C McGhee

James J Turner

David Zgonc

John R Askew

Antonio Rivas

Marcus P Zupan

A microwave-excited ultraviolet lamp system includes a microwave chamber supplied with cooling air from an air source. At least one of a pressure sensor or a temperature sensor is positioned within the system to sense a pressure associated with the flow of cooling air or a temperature of the lamp system. A control receives a signal from the sensor and is operable to adjust the flow of cooling air from the source to obtain a desired cooling air flow rate.

Ultraviolet lamp system with cooling air control

An ultraviolet lamp system for irradiating a substrate includes a magnetron and a memory physically attached to the magnetron. An electrodeless lamp is configured to emit ultraviolet light when excited by microwave energy generated from the magnetron. Main control circuitry is operable to read and write operational data associated with the magnetron to the memory. The ultraviolet lamp system is operated by generating microwave energy from the magnetron. A plasma within an electrodeless lamp is excited with the microwave energy to emit ultraviolet light. Operational data associated with the magnetron is tracked and written to the memory associated with the magnetron.

UV lamp system and associated method with improved magnetron control

An ultraviolet radiation curing system is disclosed for treating a substrate, such as fiber optic cable or silicone tubing. The system comprises a processing chamber allowing transport of a continuous piece of substrate to be treated. As the substrate moves through the processing chamber, ultraviolet radiation from a plasma lamp activated by a microwave generator treats the surface of the substrate. The system comprises two elliptical reflectors of different sizes so that larger diameter substrates may be efficiently treated with ultraviolet radiation. The system may also comprise an ultraviolet-transmissive conduit enclosing the substrate and split into a first portion and a second portion, where the second portion is movable from the first portion to open the conduit and allow insertion or alignment of the substrate within the conduit and processing chamber.

Ultraviolet curing apparatus for continuous material

An ultraviolet lamp assembly and corresponding methods is operable to generate ultraviolet light for irradiating a substrate. The lamp assembly includes a magnetron, an electrodeless lamp for emitting ultraviolet light when excited by microwave radiation generated from the magnetron, and a power control circuit arrangement configured to control an output power of the microwave radiation generated by the magnetron corresponding to the intensity of ultraviolet light produced by the lamp. A first control loop of the power control circuit is configured to regulate an input current to the magnetron based upon an input current setting associated with a desired intensity of UV light output of the lamp and a second control loop coupled to the first control loop configured to adjust the input current setting used by the first control loop to regulate the input current to the magnetron based upon an input power to the magnetron, which is proportional to the intensity of UV light output from the lamp.

Ultraviolet lamp system and method for controlling emitted UV light

A detector for an ultraviolet lamp system of the type having a microwave generator includes a first circuit that is configured to detect the microwave energy generated from the microwave generator. The first circuit includes at least one radiation sensitive component capable of failing upon exposure to an excessive amount of microwave energy. A second circuit is coupled to the first circuit and configured to intermittently test whether the radiation sensitive component has failed. An ultraviolet lamp system includes the detector. An associated method includes monitoring the microwave energy through the first circuit including at least one radiation sensitive component capable of failing upon exposure to an excessive amount of microwave energy and testing the radiation sensitive component to determine whether the radiation sensitive component has failed.

Detector for an ultraviolet lamp system and a corresponding method for monitoring microwave energy

An electrical connector includes a receptacle and a plug. The receptacle includes a tubular housing having an axial bore and at least one electrical contact within the bore. The plug is received in the bore of the receptacle housing and includes a tubular core having an axial bore and at least one electrical contact that engages the electrical contact on the receptacle when the plug is coupled to the receptacle. The plug further includes a rotatable collar for securing the plug to the receptacle. A visual indicator on at least one of the plug core or the receptacle housing is visible through a window in the collar to provide a visual indication when the plug is fully coupled to the receptacle.

High-voltage electrical connector with visual indicator

An apparatus () for generating ultraviolet radiation includes a pair of magnetrons () coupled to a longitudinally extending microwave chamber () for generating standing microwave energy waves within the chamber (). Microwave energy from the magnetrons () is directly coupled to the microwave chamber () without the use of coupling slots, antennas or other coupling structures. A longitudinally extending electrodeless plasma bulb () is mounted within the microwave chamber () and is operable to emit ultraviolet radiation () in response to excitation by the microwave energy generated by the pair of magnetrons (). The microwave chamber () includes a pair of longitudinally extending tuning walls () positioned on opposite sides of the plasma lamp bulb () and capable of overlapping the standing microwave energy waves generally along the longitudinal length of the plasma bulb ().

Apparatus and method for generating ultraviolet radiation

A radiation generating system for treating a coating on a substrate. A high voltage circuit provides power to a microwave generator that, in turn, supplies microwave radiation to drive a lamp. A current limiting device is connected between the high voltage circuit and the microwave generator, and a fault detector is connected to the high voltage circuit for providing an error signal in response to excess current being supplied to the microwave generator. A control is operative to interrupt a supply of AC power to the high voltage circuit in response to the error signal.

Microwave lamp power supply that can withstand failure in high voltage circuit

An ultraviolet lamp assembly includes an elongate lamp bulb, a central reflector mounted above the bulb and side reflector panels mounted on opposite sides of the central reflector panel. A first air gap is located between the first side reflector panel and the central reflector panel when the first and second side reflector panels are in the open position. A second air gap is located between the second side reflector panel and the central reflector panel when the first and second side reflector panels are in the open position. An air moving device is configured to direct cooling air downwardly through the perforations at the upper portion of the bulb and downwardly through the first and second air gaps at the lower portion of the bulb.

Shuttered lamp assembly and method of cooling the lamp assembly

A microwave excited ultraviolet lamp system having a single electrical cable that supplies operating voltages from a power supply to a lamp head. The single electrical cable may provide high voltage to a magnetron of the lamp head and a lesser voltage to an internal blower of the lamp head. The electrical cable may incorporate conductors for transferring communications signals between the power supply and sensors associated with the lamp head.

Microwave excited ultraviolet lamp system with single electrical interconnection

A lamp retainer for a UV lamp system includes a retainer bracket having a registration surface configured to engage a UV lamp to thereby facilitate accurate and repeatable positioning of the lamp in a lamp housing. The lamp retainer further comprises a retainer clip couplable to the retainer bracket and configured to bias a UV lamp toward the registration surface. The retainer clip facilitates removal and installation of the UV lamp in the lamp housing.

UV lamp retainer system

An exhaust system for use with a microwave excited ultraviolet lamp system is provided to receive cooling air emitted from the lamp system and to contain and direct the cooling air so as not to contact a substrate being irradiated with ultraviolet light. A lens, such as a quartz lens, is supported by the exhaust duct to transmit the ultraviolet light emitted from the lamp system toward the substrate.

Exhaust system for a microwave excited ultraviolet lamp

A reflector ( ) for use in a microwave excited ultra-violet lamp system ( ) having a plasma lamp bulb ( ). The reflector ( ) includes a pair of longitudinally extending reflector panels ( ) that are mounted in opposing, i.e., mirror facing relationship, and in space relationship to the plasma lamp bulb ( ). A longitudinally extending intermediate member ( ) is mounted in spaced relationship to the pair of reflector panels ( ) and to the plasma lamp bulb ( ). The reflector panels ( ) and the intermediate member ( ) form a pair of longitudinally extending slots ( ) that are operable to pass air toward the plasma lamp bulb ( ) to envelop the bulb ( ) effectively entirely about its outer surface. Alternatively, the pair of reflector panels ( ) are connected to longitudinally extending edges ( ) of the intermediate member ( ). The intermediate member ( ) includes multiple apertures ( ) formed therethrough that are operable to pass air toward the bulb ( ) to envelope the bulb ( ) effectively entirely about its outer surface. A method of cooling a plasma lamp bulb ( ) in a microwave excited ultraviolet lamp system ( ) is also disclosed.

Microwave excited ultraviolet lamp system with improved lamp cooling

An ultraviolet radiation generating system and methods is disclosed for treating a coating on a substrate, such as a coating on a fiber optic cable. The system comprises a microwave chamber having one or more ports capable of permitting the substrate to travel within or through a processing space of the microwave chamber. A microwave generator is coupled to the microwave chamber for exciting a longitudinally-extending plasma lamp mounted within the processing space of the microwave chamber. The plasma lamp emits ultraviolet radiation for irradiating the substrate in the processing space. A pair of reflectors are mounted within the processing space of the microwave chamber. The reflectors are capable of reflecting a significant portion of the ultraviolet radiation to irradiate the backside of the substrate in a surrounding and uniform fashion. When the system is operating, the microwave chamber is substantially closed to emission of microwave energy and ultraviolet radiation.

Ultraviolet lamp system and methods

An ultraviolet radiation generating system and methods is disclosed for treating a coating on a substrate, such as a coating on a fiber optic cable. The system comprises a microwave chamber having one or more ports capable of permitting the substrate to travel within or through a processing space of the microwave chamber. A microwave generator is coupled to the microwave chamber for exciting a longitudinally-extending plasma lamp mounted within the processing space of the microwave chamber. The plasma lamp emits ultraviolet radiation for irradiating the substrate in the processing space. A reflector is mounted within the processing space of the microwave chamber and is capable of reflecting ultraviolet radiation to uniformly irradiate the substrate in a surrounding fashion. When the system is operating, the microwave chamber is substantially closed to emission of microwave energy and ultraviolet radiation.

Growing community of inventors

Lorain, OH, United States of America

James W Schmitkons