University Court of the University of Dundee

University of Dundee

Ceimig

James Thomson

James A Cairns

Steven Paul Scott

Andrew Hourd

This invention relates to photosensitive organometallic compounds which are used in the production of metal deposits. In particular, this invention relates to photosensitive organometallic compounds such as bis-(perfluoropropyl)-1,5-cyclooctadiene platinum (II) (i.e. (CF)PtCH) which on exposure to UV radiation and then a reduction process forms a platinum metal deposit such as a substantially continuous thin 'sheet-like' film or a substantially narrow line which is capable of electrical conduction.

Metallisation

A device for decomposing the oxides of nitrogen (No ) contained in effluent compositions, such as the exhaust gases generated by automotive combustion engines, is described. In one embodiment, the device includes a reaction chamber containing an oxidisable material which when the device is in use will undergo an oxidation/reduction reaction with nitrogen oxides of nitrogen oxidation states greater than 2, especially nitrogen dioxide, to generate nitrogen and an oxide of the oxidisable material. The oxidisable material is regenerated using an electromotive force. In a particularly preferred embodiment, the reaction chamber containing the oxidisable material is associated with a further reaction chamber which is arranged upstream of the reaction chamber containing the oxidisable material. This further reaction chamber contains an oxidation catalyst which is able to oxidize nitric oxide (NO) to nitrogen dioxide (NO ) or other nitrogen oxides having a nitrogen oxidation state greater than 2. also described are processes for decomposing nitrogen oxides.

Device and method for decomposing nitrogen oxides

There is described a method of chemically depositing a substance. The method is of utility in the direct manufacture of integrated circuits and in the manufacture of a photomask for use in production of integrated circuits. The method involves the use of a compound which degrades into a deposit and a residue when a radiant beam (e.g. a laser beam) or a particle beam (e.g. an electron beam) is applied. The residue and any unreacted compound may be washed off the substrate to which it has been applied. Nanoscale dimensions of the deposit can be achieved. A particularly suitable organometallic compound is tetra-sec butyl diaurum difluoride.

Method of deposition

Oxidation and/or combustion catalyst for use in a catalytic exhaust

As replacements for chlorofluorcarbons, hydro(chloro)fluorocarbons are synthesized by hydrogenating chlorofluorocarbons over a Pd/ZnO/.gamma.--Al.sub.2 O3 catalyst. The ZnO is partially reduced before use and assists the Pd to function catalytically for days instead of hours despite the evolution of halogen.

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Dundee, United Kingdom

James Thomson