Syracuse University

James T Spencer

Damian G Allis

Fritz H Schlereth

Peter A Dowben

Richard D Ernst

Yoon G Kim

Surface modifications and improvements to piezoelectric-based sensors, such as QCMs and other piezoelectric devices, that significantly increase the sensitivity and the specificity (selectivity). These modifications can comprise mechanical and chemical changes to the surfaces of the sensors, either individually or together. For example, nanosize structures may be provided on the surface to improve sensitivity. Additionally, chemical coatings may be tethered to the surfaces, walls, or crystal to provide targeted sensitivity. Additionally, porous, layered and multiple sensor arrays may be formed to enhance sensitivity and selectivity.

Piezoelectric sensors and quartz crystal monitors

Fabrication of molecular nanosystems

A class of molecules suitable for linear and nonlinear optical applications which include charged aromatic groups which function as electronic donors and acceptors connected through polyhedral and &pgr;-organic and inorganic groups. The polyhedral and &pgr;-organic and inorganic groups function as structural and electronic bridges for the charged donors and acceptors.

Classes of high linear and nonlinear response compounds

Vapor deposition of metal films is carried out using as precursors metal compounds or complexes based on open pentadienyls and derivatives. The technique can be used favorably for transition metal depositions, and can be carried out photolytically or thermolytically. In certain cases, oxygen can be substituted for a terminal carbon atom.

Chemical vapor deposition process employing metal pentadienyl complexes

Metal or metal boride films are deposited by CVD using a metal borane cluster compound as a precursor. For a nickel film, NiCl.sub.2 is vaporized in a reactor tube in the presence of B.sub.10 H.sub.14 or another polyborane. For an aluminum film, Al(BH.sub.4).sub.3 is formed by reacting AlCl.sub.3 with NaBH.sub.4, and using the Al(BH.sub.4).sub.3 as a precursor borane cluster compound. The substrate is heated to a selected temperature so that the deposited film has a controlled stoichiometry of metal and boron.

CVD method for forming metal boride films using metal borane cluster

Depopsition of a boron nitride film is carried out by introducing decaborane and dry nitrogen or ammonia into a plasma-assisted chemical vapor deposition chamber. The nitrogen or ammonia partial pressure should provide an excess over the decarborane pressures for example 200 milliTorr of N.sub.2 or NH.sub.3 and 50 MilliTorr of B.sub.10 H.sub.14. Other film layers can also be produced starting from decaborane.

Growing community of inventors

Syracuse, NY, United States of America

James T Spencer