Asml Netherlands B.v.

James Sherwood Greeneich

Robert John Socha

Kars Zeger Troost

Donis George Flagello

Johannes Jacobus Matheus Baselmans

Arno Jan Bleeker

A lithographic apparatus including an exposure unit that exposes parallel lines on a target area of a substrate by projecting two beams of radiation onto the substrate. The two beams of radiation are projected such that they interfere with each other to form the parallel lines. An actuator continuously moves the substrate relative to the exposure unit, while the exposure unit exposes the parallel lines on the target areas on the substrate.

Lithographic apparatus and device manufacturing method using interferometric and other exposure

A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.

Lithographic apparatus and device manufacturing method

An apparatus and method for providing a variable illumination field for use in lithographic imaging for semiconductor manufacturing includes providing a an illumination system including a variable optical element having an array of addressable elements, each addressable element constructed and arranged to have a variable transmittance.

Growing community of inventors

Prescott, AZ, United States of America

James Sherwood Greeneich