International Business Machines Corporation

James Patrick Collins

Wayne Martin Moreau

Laird Chandler MacDowell

Michael Santarelli

Leo L Linehan

James Thomas Fahey

Gary T Spinillo

Randolph J Smith

Erik A Puttlitz

Judy B Dorn

William J Miller

Detection of an evolving or diffusing gaseous substance emanating from an irradiated or thermolyzed layer of polymeric composition in semiconductor processing or similar processes is disclosed. The evolving or diffusing gaseous substance is detected by spatially disposing from the irradiated or thermolyzed layer a detector layer that includes a compound having leaving groups that are sensitive to the gaseous substance being detected.

Detection of a gaseous substance emanating from a layer of polymeric composition

Microbridge formation in chemically amplified negative tone photoresists based on poly(hydroxystyrene) (PHS) is avoided when the PHS is blended together with a co-polymer of PHS and an acrylic polymer such as poly(methyl methacrylate) (PMMA). The blend should include at least 10% by weight of the co-polymer. In operation, hydrogen bonding between the hydroxystyrene sub-units and the methacrylate sub-units decreases the availability of sites for crosslinking, and this reduction in crosslinking sites makes the blend less susceptible to formation of polymer resist microbridges. The invention is practicable with a polymers having a wide range of molecular weights (2000-50000 daltons), and development can be achieved using the industry standard 2.38 wt % trimethylammonium hydroxide (TMAH) developer without any adverse impact on the photoresist.

Composition for eliminating microbridging in chemically amplified

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Shelburne, VT, United States of America

James Patrick Collins