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Colorado Springs, CO, United States of America

James Pan

Average Co-Inventor Count = 1.65

ph-index = 4

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 55

James PanRandhir P Thakur (4 patents)James PanGuoqing Chen (4 patents)James PanRandhir P S Thakur (3 patents)James PanJames Pan (14 patents)Randhir P ThakurRandhir P Thakur (175 patents)Guoqing ChenGuoqing Chen (17 patents)Randhir P S ThakurRandhir P S Thakur (143 patents)
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Inventor’s number of patents
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Strength of working relationships

Company Filing History:

1. Micron Technology Incorporated (14 from 38,002 patents)


14 patents:

1. 7432152 - Methods of forming HSG layers and devices

2. 7229890 - Forming integrated circuits using selective deposition of undoped silicon film seeded in chlorine and hydride gas

3. 7029537 - Method of processing selected surfaces in a semiconductor process chamber based on a temperature differential between surfaces

4. 7022570 - Methods of forming hemispherical grained silicon on a template on a semiconductor work object

5. 6881277 - Method of processing selected surfaces in a semiconductor process chamber based on a temperature differential between surfaces

6. 6835617 - Methods of forming hemispherical grained silicon on a template on a semiconductor work object

7. 6828193 - Methods of forming hemispherical grained silicon on a template on a semiconductor work object

8. 6544842 - Method of forming hemisphere grained silicon on a template on a semiconductor work object

9. 6521507 - Selective deposition of undoped silicon film seeded in chlorine and hydride gas for a stacked capacitor

10. 6395099 - Method of processing selected surfaces in a semiconductor process chamber based on a temperature differential between surfaces

11. 6355182 - High selectivity etching process for oxides

12. 6217784 - High selectivity etching process for oxides

13. 6146967 - Selective deposition of amorphous silicon film seeded in a chlorine gas

14. 6126847 - High selectivity etching process for oxides

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