International Business Machines Corporation

James McKell Edwin Harper

Cyril Cabral, Jr

Roy Arthur Carruthers

Christian Lavoie

Ronnen Andrew Roy

Yun Yu Wang

Evan G Colgan

Kirk David Peterson

Chao-Kun Hu

Paul David Agnello

Robert J Purtell

Jean Louise Jordan-Sweet

Cyprian Emeka Uzoh

Daniel C Edelstein

Andrew Herbert Simon

James L Speidell

Frank Benjamin Kaufman

Robert Lee Melcher

Margaret Paggi Manny

Lawrence Alfred Clevenger

Katherine Lynn Saenger

Kenneth Parker Rodbell

Kim Yang Lee

Thomas M Shaw

Randy William Mann

James Spiros Nakos

Robert Rosenberg

Ismail C Noyan

Glen L Miles

Stephen Bruce Brodsky

Joseph S Newbury

Francois M d'Heurle

Patricia A O'Neil

Paul Michael Kozlowski

Hiroshi Takatsuji

A reflective spatial light modulator array is described incorporating liquid crystal devices, mirrors, a semiconductor substrate, electrical circuits, and a light blocking layer. The light blocking layer can be a reflector/absorber layer containing titanium. The light blocking layer can be a layer resulting in attenuation of incident light below a certain level at the semiconductor substrate. The invention overcomes the problem of shielding light from semiconductor devices, high optical throughput and contrast, pixel storage capacitance to hold the voltage across the liquid crystal device and precise control of the liquid crystal device thickness without spacers obscuring the mirrors.

Reflective spatial light modulator array including a light blocking layer

A method of reducing the contact resistance of metal silicides to the p+ silicon area or the n+ silicon area of the substrate comprising: (a) forming a metal germanium (Ge) layer over a silicon-containing substrate, wherein said metal is selected from the group consisting of Co, Ti, Ni and mixtures thereof; (b) optionally forming an oxygen barrier layer over said metal germanium layer; (c) annealing said metal germanium layer at a temperature which is effective in converting at least a portion thereof into a substantially non-etchable metal silicide layer, while forming a Si&#x2014;Ge interlayer between said silicon-containing substrate and said substantially non-etchable metal silicide layer; and (d) removing said optional oxygen barrier layer and any remaining alloy layer. When a Co or Ti alloy is employed, e.g., Co&#x2014;Ge or Ti&#x2014;Ge, two annealing steps are required to provide the lowest resistance phase of those metals, whereas, when Ni is employed, a single annealing step forms the lowest resistance phase of Ni silicide.

Method and structure for reduction of contact resistance of metal silicides using a metal-germanium alloy

A method of producing electrical contacts having reduced interface roughness as well as the electrical contacts themselves are disclosed herein. The method of the present invention comprises (a) forming an alloy layer having the formula MX, wherein M is a metal selected from the group consisting of Co and Ni and X is an alloying additive, over a silicon-containing substrate; (b) optionally forming an optional oxygen barrier layer over said alloy layer; (c) annealing said alloy layer at a temperature sufficient to form a MXSi layer in said structure; (d) removing said optional oxygen barrier layer and any remaining alloy layer; and optionally (e) annealing said MXSi layer at a temperature sufficient to form a MXSilayer in said structure.

Structure for controlling the interface roughness of cobalt disilicide

A method of producing electrical contacts having reduced interface roughness as well as the electrical contacts themselves are disclosed herein. The method of the present invention comprises (a) forming an alloy layer having the formula MX, wherein M is a metal selected from the group consisting of Co and Ni and X is an alloying additives over a silicon-containing substrate; (b) optionally forming an optional oxygen barrier layer over said alloy layer; (c) annealing said alloy layer at a temperature sufficient to form a MXSi layer in said structure; (d) removing said optional oxygen barrier layer and any remaining alloy layer; and optionally (e) annealing said MXSi layer at a temperature sufficient to form a MXSi layer in said structure.

Method and structure for controlling the interface roughness of cobalt disilicide

A method of reducing the contact resistance of metal silicides to the p&plus; silicon area or the n&plus; silicon area of the substrate comprising: (a) forming a metal germanium (Ge) layer over a silicon-containing substrate, wherein said metal is selected from the group consisting of Co, Ti, Ni and mixtures thereof; (b) optionally forming an oxygen barrier layer over said metal germanium layer; (c) annealing said metal germanium layer at a temperature which is effective in converting at least a portion thereof into a substantially non-etchable metal silicide layer, while forming a Si&mdash;Ge interlayer between said silicon-containing substrate and said substantially non-etchable metal silicide layer; and (d) removing said optional oxygen barrier layer and any remaining alloy layer. When a Co or Ti alloy is employed, e.g., Co&mdash;Ge or Ti&mdash;Ge, two annealing steps are required to provide the lowest resistance phase of those metals, whereas, when Ni is employed, a single annealing step forms the lowest resistance phase of Ni silicide.

An electrical conductor for use in an electronic structure is disclosed which includes a conductor body that is formed of an alloy including between about 0.001 atomic % and about 2 atomic % of an element selected from the group consisting of Ti, Zr, In, Sn and Hf; and a liner abutting the conductor body which is formed of an alloy that includes Ta, W, Ti, Nb and V. The invention further discloses a liner for use in a semiconductor interconnect that is formed of a material selected from the group consisting of Ti, Hf, In, Sn, Zr and alloys thereof, TiCu , Ta Ti , Ta , Hf , Ta , In , Ta Sn , Ta Zr .

Interconnects with Ti-containing liners

A method of producing electrical contacts having reduced interface roughness as well as the electrical contacts themselves are disclosed herein. The method of the present invention comprises (a) forming an alloy layer having the formula MX, wherein M is a metal selected from the group consisting of Co and Ni and X is an alloying additive, over a silicon-containing substrate; (b) optionally forming an optional oxygen barrier layer over said alloy layer; (c) annealing said alloy layer at a temperature sufficient to form a MXSi layer in said structure; (d) removing said optional oxygen barrier layer and any remaining alloy layer; and optionally (e) annealing said MXSi layer at a temperature sufficient to form a MXSi layer in said structure.

Reflective spatial light modulator array is described incorporating liquid crystal devices, mirrors, a semiconductor substrate, electrical circuits, and a reflector/absorber layer for blocking light. The invention overcomes the problem of shielding light from semiconductor devices, high optical throughput and contrast, pixel storage capacitance to hold the voltage across the liquid crystal device and precise control of the liquid crystal device thickness without spacers obscuring the mirrors.

Reflective spatial light modulator array

Complementary metal oxide semiconductor (CMOS) devices having metal silicide contacts that withstand the high temperature anneals used in activating the source/drain regions of the devices are provided by adding at least one alloying element to an initial metal layer used in forming the silicide.

Method and structure for retarding high temperature agglomeration of silicides using alloys

The present invention discloses an interconnection structure for providing electrical communication with an electronic device which includes a body that is formed substantially of copper and a seed layer of either a copper alloy or a metal that does not contain copper sandwiched between the copper conductor body and the electronic device for improving the electromigration resistance, the adhesion property and other surface properties of the interconnection structure. The present invention also discloses methods for forming an interconnection structure for providing electrical connections to an electronic device by first depositing a seed layer of copper alloy or other metal that does not contain copper on an electronic device, and then forming a copper conductor body on the seed layer intimately bonding to the layer such that electromigration resistance, adhesion and other surface properties of the interconnection structure are improved.

Copper interconnection structure incorporating a metal seed layer

A method for achieving, and a structure containing, a thin film refractory metal with a generally symmetric microstructual morphology. Incorporation of between 1 and 5% by atomic fraction nitrogen into the refractory metal selected from the group of Ti, V, Cr, Nb, Mo, Ta, W and alloys thereof results in the desired structural morphology and electrical resistance. Multi-layer structures can be built up of alternate layers of refractory metal with and without nitrogen to achieve a desired product. Alternate layers can vary in thickness and nitrogen content.

Modification of in-plate refractory metal texture by use of refractory metal/nitride layer

A method of reducing contact resistance of metal silicides to a silicon-containing substrate is provided. The method includes first forming a metal germanium layer over a silicon-containing substrate. An optionally oxygen barrier layer may be formed over the metal germanium layer. Next, the structure containing the metal germanium layer is annealed at a temperature effective in converting at least a portion of the metal germanium layer into a substantially non-etchable metal silicide layer, while forming a Si-Ge interlayer between the substrate and the silicide layer. After annealing, the optional oxygen barrier layer and any remaining metal germanium layer is removed from the substrate.

A method of substantially reducing Si consumption and bridging during metal silicide contact formation comprising the steps of: (a) forming a metal silicon alloy layer over a silicon-containing substrate containing an electronic device to be electrically contacted, said silicon in said alloy layer being less than about 30 atomic % and said metal is Co, Ni or mixtures thereof; (b) annealing said metal silicon alloy layer at a temperature of from about 300&deg; to about 500&deg; C. so as to form a metal rich silicide layer that is substantially non-etchable compared to said metal silicon alloy or pure metal; (c) selectively removing any non-reacted metal silicon alloy over non-silicon regions; and (d) annealing said metal rich silicide layer under conditions effective in forming a metal silicide phase that is in its lowest resistance phase. An optional oxygen barrier layer may be formed over the metal silicon alloy layer prior to annealing step (b).

Method for self-aligned formation of silicide contacts using metal silicon alloys for limited silicon consumption and for reduction of bridging

Low resistivity titanium silicide, and semiconductor devices incorporating the same, may be formed by titanium alloy comprising titanium and 1-20 atomic percent refractory metal deposited in a layer overlying a silicon substrate, the substrate is then heated to a temperature sufficient to substantially form C54 phase titanium silicide. The titanium alloy may further comprise silicon and the refractory metal may be Mo, W, Ta, Nb, V, or Cr, and more preferably is Ta or Nb. The heating step used to form the low resistivity titanium silicide is performed at a temperature less than 900&deg; C., and more preferably between about 600-700&deg; C.

Low temperature formation of low resistivity titanium silicide

The present invention discloses an interconnection structure for providing electrical communication with an electronic device which includes a body that is formed substantially of copper and a seed layer of either a copper alloy or a metal that does not contain copper sandwiched between the copper conductor body and the electronic device for improving the electromigration resistance, the adhesion property and other surface properties of the interconnection structure. The present invention also discloses, methods for forming an interconnection structure for providing electrical connections to an electronic device by first depositing a seed layer of copper alloy or other metal that does not contain copper on an electronic device, and then forming a copper conductor body on the seed layer intimately bonding to the layer such that electromigration resistance, adhesion and other surface properties of the interconnection structure are improved.

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Yorktown Heights, NY, United States of America

James McKell Edwin Harper