International Business Machines Corporation

James M Robert

George W Banke, Jr

James Albert Slinkman

Carlos Strocchia-Rivera

Philip V Kaszuba

Leon Moszkowicz

Andrew Deering

Determination of non-linearity of a positioning scanner of a measurement tool is disclosed. In one embodiment, a method may include providing a probe of a measurement tool coupled to a positioning scanner; scanning a surface of a first sample with the surface at a first angle relative to the probe to attain a first profile; scanning the surface of the first sample with the surface at a second angle relative to the probe that is different than the first angle to attain a second profile; repeating the scannings to attain a plurality of first profiles and a plurality of second profiles; and determining a non-linearity of the positioning scanner using the different scanning angles to cancel out measurements corresponding to imperfections due to the surface of the sample. The non-linearity may be used to calibrate the positioning scanner.

Non-linearity determination of positioning scanner of measurement tool

The invention generally relates to atomic resolution imaging, and, more particularly, to systems and methods for calibrating an atomic resolution measurement tool. A sample holder for holding test samples used in measuring linearity of an atomic force microscope is provided. The holder includes a body having a top surface, and a plurality of inclined regions formed in the body and spaced apart along the top surface. Each of the inclined regions is structured and arranged to hold a test sample used to measure linearity of an atomic force microscope at one of a plurality of predefined angles.

Sample holder for holding samples at pre-determined angles

A method for measuring an integrated circuit (IC) structure by measuring an imprint of the structure, a method for preparing a test site for the above measuring, and IC so formed. The method for preparing the test site includes incrementally removing the structure from the substrate so as to reveal an imprint of the removed bottom surface of the structure in a top surface of the substrate. The imprint can then be imaged using an atomic force microscope (AFM). The image can be used to measure the bottom surface of the structure.

Integrated circuit and methods of measurement and preparation of measurement structure

Methods of measurement and preparation of measurement structure of integrated circuit

Growing community of inventors

Burlington, VT, United States of America

James M Robert