Hampshire Instruments, Inc.

University of Rochester

Sios, Inc.

James M Forsyth

Robert David Frankel

Robert G Zambelli

John F Hoose

Thomas L Duft

Joseph A Abate

Robert Frankel

Lisa Gregorka

Alan E Rosenbluth

Malcolm M Drummond

A system for biomolecular separation and detection of a molecular species includes a solid state laser detector having a sample channel therein. The presence of a molecular species is indicated by a frequency shift in the laser's output, which is detected by optical heterodyning the laser's output with the output of a reference laser. The interior of the sample channel is optionally coated with a ligand for binding the molecular species of interest. The system involves preprocessing a sample by electroosmotic separation in channels that are lithographically formed in a two-dimensional planar substrate. Molecular separation is also accomplished in a nanostructural molecular sieve comprising spaced apart posts defining narrow channels therebetween.

Apparatus and method for the detection and assay of organic molecules

An x-ray lithography system is disclosed in which x-rays are generated by directing a high energy laser beam against a metal target to form an x-ray emitting plasma. The x-rays from the plasma are then directed through a mask towards a resist covered wafer to cause a patterned exposure on the wafer resist coating. The mask, the portion of the target which the laser beam strikes and the portion of the wafer to be exposed are all within an evacuated chamber. The laser, prior to entering the chamber, is split into two separate beams, each of which are focused and directed through a window in the side of the chamber towards the same spot on the target. Apparatus, including an air bearing, seal and positioner, is provided to move the target at periodic intervals. Similar apparatus is provided to move the wafer from exposure section to exposure section. The laser beam system includes a face pumped laser beam amplifier and unidirectional beam expanders to allow the maximum energy to be transferred to the laser beam by the amplifier. A series of two or more laser pulses are provided in order to maximize the energy obtained from the laser amplifier. A magnet and a membrane shield are also provided to prevent high energy particles and dust contaminants from the plasma from effecting the lithography process. A materials handling device is provided for moving wafers, targets and masks and an alignment system operating within the evacuated chamber, positions of the wafer with respect to the mask prior to the exposure thereof.

X-ray lithography system

An x-ray lithography system is disclosed in which x-rays are generated by directing a high energy laser beam against a metal target to form an x-ray emitting plasma. The x-rays from the plasma are then directed through a mask towards a resist covered wafer to cause a patterned exposure on the wafer resist coating. The mask, the portion of the target which the laser beam strikes and the portion of the water to be exposed are all within an evacuated chamber. The laser, prior to entering the chamber, is split into two separate beams, each of which are focused and directed through a window in the side of the chamber towards the same spot on the target. Apparatus, including an air bearing, seal and positioner, is provided to move the target at periodic intervals. Similar apparatus is provided to move the wafer from exposure section to exposure section. The laser beam system includes a face pumped laser beam amplifier and unidirectional beam expanders to allow the maximum energy to be transferred to the laser beam by the amplifier. A series of two or more laser pulses are provided in order to maximize the energy obtained from the laser amplifier. A magnet and a membrane shield are also provided to prevent high energy particles and dust contaminants from the plasma from effecting the lithography process. A materials handling device is provided for moving wafers, targets and masks and an alignment system operating within the evacuated chamber, positions of the wafer with respect to the mask prior to the exposure thereof.

Disclosed herein is an X-ray lithography system having a long life target. The life of the conventional target in X-ray generating systems for use in X-ray lithography systems is increased by providing means by which a single laser pulse can be provided to the same spot a plurality of times. In addition, new target designs are provided which are mechanically moved to allow laser pulses to be provided to adjacent points over a large surface area. One type of target is a cylindrical drum which is helically rotated to allow the laser pulse to intersect at all points along the helix of the drum. A second type of long life target is a long continuous strip in which a strip is moved from a feed reel to a take-up reel. The strip may be within a cassette.

Long life X-ray source target

Long life x-ray source target

Disclosed herein is a X-ray lithography system in which X-rays are generated by a laser beam focused upon a target within an evacuated chamber to create a soft X-ray emitting plasma which also emits debris particles. A thin sheet of X-ray transparent gas is provided between the target and a mask used in the lithographic process to displace the particles away from the mask. The sheet of gas may also be used to maintain a pressure differential across an opening in the evacuated chamber through which the X-rays pass towards the target. In addition, the gas sheet may be used to cool the X-ray mask by placing the mask close to the sheet but at a sufficient distance so that the sheet does not interfere with the mask.

Mirror structures are described which provide high normal incidence reflectivities at x-ray wavelengths (such as soft x-ray wavelengths in the range 70 A to 300 A) where conventional metallic reflectors can not function. The mirror is made up of an array of repeated periods each consisting of monoatomic metallic layers and Langmuir-Blodgett hydrocarbon molecular layers. The mirror may also include additional Langmuir-Blodgett bilayers serving as spacer layers and/or additional reflection-enhancing metal films. The various layers are systematically deposited in such a way that, first, the mirror structures are periodic, and second, that the average separation between metallic layers maximizes the reflectance at the design wavelength. Such mirror structures can be configured to define a resonant cavity to support x-ray laser action.

Growing community of inventors

Macedon, NY, United States of America

James M Forsyth