Asml Netherlands B.v.

Asml Holding N.v.

James Kennon

Theodorus Petrus Maria Cadee

Matthew Lipson

Noud Jan Gilissen

Rene Theodorus Petrus Compen

Ronald A Wilklow

Kennard White

Peter Richard Helmus

Wilbur Jordan Reichmann, Ii

An electrostatic clamp for use in a lithographic apparatus includes burls and an electrode surrounded by an insulator and/or a dielectric material between adjacent burls. In an embodiment, two or more layers of dielectric material are provided between adjacent burls and surround an electrode provided between adjacent burls. The electrostatic clamp may be used to clamp an object to an object support in a lithographic apparatus.

Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp

A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviations of the protrusions, a material removing device arranged to modify a height of the protrusion material, a controller coupled between the detector and the material removing device, wherein material removing device includes a removal tool selected from the group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool.

Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system

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Benicia, CA, United States of America

James Kennon