University of Massachusetts

US Government As Represented by the Secretary of the Army

Sekisui Chemical Co., Ltd.

James J Watkins

Michael R Beaulieu

Nicholas R Hendricks

Jason M Blackburn

Wenhao Li

David P Long

Yinfeng Zong

Jason L Lazorcik

Victor Champagne

Thomas J McCarthy

Rohit Kothari

Masashi Kanoh

Kenichi Shinmei

Rasika Dasanayake Aluthge

Feyza Dundar Arisoy

Yuying Tang

David Schmidt

David M Hess

Jacobo Morere Rodriguez

Rajaram Pai

Albertina Cabanas

Irene R Howell

Vincent Einck

Feyza Dundar

Susumu Koizumi

Dong-Po Song

Vikram K Daga

Ying Lin

Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.

Patterned nanoparticle structures

In various embodiments, the present invention provides a method comprising: disposing upon a first substrate, a first coating; texturing the first coating with a stamp; treating the textured first coating to form a master mold; where the master mold contains a mirror image of the texture contained in the first coating; and transferring the texture from the master mold to a second substrate.

Master mold for pattern transfer

Various examples disclosed relate to a method of manufacturing a mechanically stabilized material that includes a nanostructure. The method includes providing a curable material disposed on a substrate. The curable material includes inorganic nanoparticles. The method further includes exposing the curable material and the substrate to pulsed electromagnetic radiation to form the mechanically stabilized material.

Thermal imprinting of nanostructure materials

Various embodiments disclosed relate to methods of manufacturing textured surfaces nanoimprint lithography with nanoparticulate inks. The present invention provides methods that allow flexible patterning of substrates with features having complex geometries.

Patterning of complex metal oxide structures

Various embodiments disclosed relate to methods of manufacturing a textured surface comprising disposing a nanoparticulate ink on a substrate.

Patterning of nanostructures using imprint lithography

Various embodiments disclosed relate to novel methods of fabricating 3-D Li ion batteries using direct nanoimprint lithography. The present invention includes methods of fabricating high surface area electrodes, including imprint patterning of high aspect ratio parallel grating style electrodes. The method includes coating a substrate with an ink containing nanoparticles and subsequently annealing the ink into a desired pattern.

Direct printing of 3-D microbatteries and electrodes

Various embodiments disclosed relate to a method of forming a composite including a carbon composite structure. The method includes disposing a precursor composition on a substrate. The composition includes a porogen component, a carbon component, and a catalyst component. The method further includes irradiating the precursor composition to form the carbon composite structure.

Nanoporous structures and assemblies incorporating the same

Direct printing of 3-d microbatteries and electrodes

Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy, Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.

Aspects relate to patterned nanostructures having a feature size not including film thickness below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder material, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a suitable pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure in accordance with suitable applications.

Various embodiments disclosed relate to a method of cold-spray deposition involving cooling the cold-spray nozzle by at least one of expanding and vaporizing a compressed cooling fluid in proximity to the cold-spray nozzle. The present disclosure also includes a cold-spray deposition spray head, a cooling jacket for a cold-spray deposition nozzle and a cold-spray deposition system comprising the same.

Active cooling of cold-spray nozzles

Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder material, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a suitable pattern on to the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and suitably joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may, in turn, be arranged to form a three-dimensional patterned nanostructure in accordance with suitable applications.

An electrical insulation layer including microparticles and having a mesoporous structure; and a battery device including a cathode, an anode, an electrical insulation layer including microparticles and having a mesoporous structure, the electrical insulation layer being arranged between the anode and the cathode, and an ion conductive composition.

Growing community of inventors

South Hadley, MA, United States of America

James J Watkins