Raytech Innovative Solutions, LLC

Raytech Composites, Inc.

Raybestos Products Company

James J Petroski

Paul Fathauer

Richard D Cooper

David Perry

James P Macey

Samuel A Truncone

Angela Mroczek-Petroski

Laurie Bowles

John J Easton

A polishing pad for use in chemical mechanical polishing of substrates that being made of fibrous matrix such as cellulose with a binder consisting of thermoset resin material, such as phenolic resin. The polishing surface is ground to form asperities. The polishing pad provides a porous structure by which polishing slurry and polishing debris during chemical mechanical polishing of substrates are stored for subsequent rinsing away, and for enhanced flow-distribution of the polishing slurry. Also disclosed is a method of making the polishing pad.

Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same

A friction disk suitable for running as an assembly of interleaved disks in a transmission is disclosed. A rigid metallic core on backing plate is covered on one or both sides with a wafer of non-woven yarn wherein the yarn comprises a continuous wound length of heat resistant yarn in a non-overlapping fashion. The yarn is bonded to the core by a thermosetting resin, which is impregnated into the yarn by less than 80% by weight to preserve porosity and allowing penetration of the cooling transmission fluid. The yarn preferably is composed of carbon fibers or filaments.

Continuous yarn laid wet friction material

A conventional circular friction disk having a metal backing plate and outer layer of friction material is replaced by a disk having a plurality of straight outer side edges joined by curved edges, in order to effect material savings in the manufacturing process, and without significant loss in performance.

Polygonal friction disk and method

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Crawfordsville, IN, United States of America

James J Petroski